| 11504669 |
Method for exhaust gas abatement under reduced pressure and apparatus therefor |
Michihiko Yanagisawa, Hiroshi Imamura |
2022-11-22 |
| 10617997 |
Apparatus for exhaust gas abatement under reduced pressure |
Masashi Maeda, Akihisa Yoshida, Michihiko Yanagisawa, Hiroshi Imamura |
2020-04-14 |
| 9120072 |
Ammonia detoxification device |
Hiroshi Imamura, Hiroki KUZUOKA, Hiroaki Kaneshiro, Isamu Nagai, Takashi Kataoka |
2015-09-01 |
| 6199505 |
Plasma processing apparatus |
Hisaaki Sato, Shigeru Mizuno, Nobuaki Tsuchiya |
2001-03-13 |
| 6043608 |
Plasma processing apparatus |
Seiji Samukawa, Yukito Nakagawa, Hisaaki Sato, Kibatsu Shinohara, Yasuo Niimura |
2000-03-28 |
| 6016765 |
Plasma processing apparatus |
Yoichiro Numasawa, Shinya Hasegawa, Nobuyuki Takahashi |
2000-01-25 |
| 5961776 |
Surface processing apparatus |
Hisaaki Sato, Yukito Nakagawa, Ken-ichi Takagi, Tomoaki Koide |
1999-10-05 |
| 5936352 |
Plasma processing apparatus for producing plasma at low electron temperatures |
Seiji Samukawa, Yukito Nakagawa, Kibatsu Shinohara, Hirofumi Matsumoto, Hiroyuki Ueyama |
1999-08-10 |
| 5900699 |
Plasma generator with a shield interposing the antenna |
Seiji Samukawa, Yukito Nakagawa, Kibatsu Shinohara, Hiroyuki Ueyama |
1999-05-04 |
| 5565738 |
Plasma processing apparatus which uses a uniquely shaped antenna to reduce the overall size of the apparatus with respect to the plasma chamber |
Seiji Samukawa, Kibatsu Shinohara, Hirobumi Matsumoto, Yukito Nakagawa |
1996-10-15 |
| 5087341 |
Dry etching apparatus and method |
Etsuo Wani, Koki Yasuda |
1992-02-11 |
| 4968374 |
Plasma etching apparatus with dielectrically isolated electrodes |
Toshio Tamaki, Tatsuhiko Yoshida |
1990-11-06 |
| 4950956 |
Plasma processing apparatus |
Tatsuo Asamaki, Kiyoshi Hoshino, Katsumi Ukai, Yoichi Ino, Toshio Adachi |
1990-08-21 |
| 4816638 |
Vacuum processing apparatus |
Katsumi Ukai, Kouji Ikeda, Toshio Adachi |
1989-03-28 |
| 4655800 |
Waste gas exhaust system for vacuum process apparatus |
Ishao Ashaishi, Tatsunori Koizumi, Kouji Ikeda |
1987-04-07 |
| 4482419 |
Dry etching apparatus comprising etching chambers of different etching rate distributions |
Etsuo Wani, Katsumi Ukai, Teruo Saitoh |
1984-11-13 |
| 4430151 |
Method of monitoring status of a silicon layer by detecting, emission spectra variable during etching |
— |
1984-02-07 |
| 4405989 |
Spectral monitoring device for both plasma etching and sputtering |
Katsumi Ukai |
1983-09-20 |
| 4399016 |
Plasma device comprising an intermediate electrode out of contact with a high frequency electrode to induce electrostatic attraction |
Hideo Takei |
1983-08-16 |
| 4376692 |
Dry etching device comprising a member for bringing a specimen into electrical contact with a grounded electrode |
Katsumi Ukai |
1983-03-15 |
| 4352725 |
Dry etching device comprising an electrode for controlling etch rate |
— |
1982-10-05 |