Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12424441 | Chemical-resistant protective film | Yuto HASHIMOTO, Yuki Endo | 2025-09-23 |
| 12344758 | Chemical solution-resistant protective film forming composition containing polymerization product having diol structure at terminal thereof | Takafumi Endo | 2025-07-01 |
| 12331156 | Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer | Shigetaka OTAGIRI, Takafumi Endo, Yuki Endo, Takahiro Kishioka | 2025-06-17 |
| 12087576 | Composition for forming coating film and method for manufacturing semiconductor device | Rikimaru Sakamoto, Yasunobu Someya, Takahiro Kishioka | 2024-09-10 |
| 12077633 | Chemical-resistant protective film-forming composition containing polymerization product of arylene compound having glycidyl group | Takafumi Endo, Ryuta MIZUOCHI | 2024-09-03 |
| 12044968 | Protective film-forming composition having acetal structure and amide structure | Takafumi Endo, Yuki Endo, Takahiro Kishioka | 2024-07-23 |
| 12025915 | Resist underlayer film-forming composition comprising polymer having structural unit having urea linkage | Yuichi Goto, Rikimaru Sakamoto, Gun SON | 2024-07-02 |
| 11965059 | Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer | Shigetaka OTAGIRI, Takafumi Endo, Yuki Endo, Takahiro Kishioka | 2024-04-23 |
| 11675270 | Resist underlayer film-forming composition | Rikimaru Sakamoto | 2023-06-13 |
| 11194251 | Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure | Ryo Karasawa, Yasunobu Someya, Takafumi Endo, Rikimaru Sakamoto | 2021-12-07 |
| 11130855 | Composition for forming release layer, and release layer | Kazuya Shindo, Kazuya Ebara, Bangching Ho | 2021-09-28 |
| 11009795 | Aqueous solution for resist pattern coating and pattern forming methods using the same | Rikimaru Sakamoto | 2021-05-18 |
| 10795261 | Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same | Rikimaru Sakamoto | 2020-10-06 |
| 10613435 | Coating solution for resist pattern coating and method for forming pattern | Rikimaru Sakamoto | 2020-04-07 |
| 10295907 | Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure | Ryo Karasawa, Yasunobu Someya, Takafumi Endo, Rikimaru Sakamoto | 2019-05-21 |
| 10242871 | Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group | Noriaki Fujitani, Rikimaru Sakamoto | 2019-03-26 |
| 10133178 | Coating liquid for resist pattern coating | Shuhei Shigaki, Noriaki Fujitani, Takafumi Endo, Rikimaru Sakamoto | 2018-11-20 |
| 10113083 | Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound | Ryuji Ohnishi, Ryuta MIZUOCHI, Yasushi Sakaida, Rikimaru Sakamoto | 2018-10-30 |
| 9910354 | Resist underlayer film-forming composition and method for forming resist pattern using the same | Yasushi Sakaida, Noriaki Fujitani, Rikimaru Sakamoto | 2018-03-06 |
| 9448480 | Resist underlayer film formation composition and method for forming resist pattern using the same | Ryuji Ohnishi, Noriaki Fujitani, Rikimaru Sakamoto | 2016-09-20 |
| 9394231 | Composition for forming antistatic film and oligomer compound | Ryuta MIZUOCHI, Rikimaru Sakamoto, Tomohisa Yamada, Naoki Nakaie, Yuki TAKAYAMA | 2016-07-19 |