| 12417902 |
Method for cleaning a chamber |
Ran Lin, Wenbing Yang, Jengyi Yu, Samantha Tan, Yang Pan +1 more |
2025-09-16 |
| 12400842 |
Method of cleaning chamber components with metal etch residues |
Wenbing Yang, Samantha Tan, Ran Lin, Chunhong Zhou, Xiaoyu Kang +2 more |
2025-08-26 |
| 12266542 |
Atomic layer etching for subtractive metal etch |
Wenbing Yang, Mohand Brouri, Samantha Tan, Shih-Ked Lee, Yiwen FAN +3 more |
2025-04-01 |
| 12256645 |
Chemical etch nonvolatile materials for MRAM patterning |
Wenbing Yang, Zhongwei Zhu, Samantha Tan, Ran Lin, Yang Pan +2 more |
2025-03-18 |
| 12080562 |
Atomic layer etch and ion beam etch patterning |
Samantha Tan, Wenbing Yang, Girish Dixit, Yang Pan |
2024-09-03 |
| 11935758 |
Atomic layer etching for subtractive metal etch |
Wenbing Yang, Mohand Brouri, Samantha Tan, Shih-Ked Lee, Yiwen FAN +3 more |
2024-03-19 |
| 11450513 |
Atomic layer etching and smoothing of refractory metals and other high surface binding energy materials |
Wenbing Yang, Mohand Brouri, Samantha Tan, Yang Pan, Keren Jacobs Kanarik |
2022-09-20 |
| 10763083 |
High energy atomic layer etching |
Wenbing Yang, Samantha Tan, Keren Jacobs Kanarik, Yang Pan |
2020-09-01 |
