Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8232712 | Small electron gun | Takashi Ohshima | 2012-07-31 |
| 7339167 | Charged particle beam apparatus | Takashi Ohshima, Mitsugu Sato | 2008-03-04 |
| 7238939 | Small electron gun | Takashi Ohshima | 2007-07-03 |
| 7166013 | Polishing apparatus and method for producing semiconductors using the apparatus | Shigeo Moriyama, Yoshihiro Ishida, Takashi Kugaya, Shigeo Ootsuki, Sadayuki Nishimura +2 more | 2007-01-23 |
| 7137866 | Polishing apparatus and method for producing semiconductors using the apparatus | Shigeo Moriyama, Yoshihiro Ishida, Takashi Kugaya, Shigeo Ootsuki, Sadayuki Nishimura +2 more | 2006-11-21 |
| 6849542 | Method for manufacturing a semiconductor device that includes planarizing with a grindstone that contains fixed abrasives | Ui Yamaguchi, Seiichi Kondo, Kan Yasui, Masahiro Kaise, Minoru Honda | 2005-02-01 |
| 6099393 | Polishing method for semiconductors and apparatus therefor | Shigeo Moriyama, Kan Yasui, Katsuhiko Yamaguchi | 2000-08-08 |
| 5420436 | Methods for measuring optical system, and method and apparatus for exposure using said measuring method | Eiichi Seya, Massaaki Ito, Tsuneo Terasawa, Minoru Hidaka, Eiji Takeda +1 more | 1995-05-30 |
| 5408320 | Workpiece having alignment marks for positioning a pattern at a different pitch to be formed thereon, and method for fabricating the same | Shigeo Moriyama, Tsuneo Terasawa, Masaaki Itou | 1995-04-18 |
| 5331369 | Method of forming patterns and apparatus for carrying out the same | Tsuneo Terasawa, Katsunobu Hama | 1994-07-19 |
| 5222112 | X-ray pattern masking by a reflective reduction projection optical system | Tsuneo Terasawa, Masaaki Itou, Shigeo Moriyama, Hiroshi Fukuda | 1993-06-22 |
| 5200798 | Method of position detection and the method and apparatus of printing patterns by use of the position detection method | Shigeo Moriyama, Tsuneo Terasawa, Masaaki Itou | 1993-04-06 |
| 5164789 | Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference | Yasuhiro Yoshitake, Yoshitada Oshida, Shuji Sugiyama, Yoshimitsu Saze | 1992-11-17 |
| 4857744 | Optical projection printing apparatus wherein wafer mark has a grating pitch in the sagittal plane of the first optical system | Keiji Kataoka, Toshiei Kurosaki, Seiji Yonezawa | 1989-08-15 |