Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8557611 | Manufacturing method of semiconductor device, exposure method, and exposure apparatus | — | 2013-10-15 |
| 7875409 | Method of manufacturing semiconductor device, mask and semiconductor device | Shinroku Maejima, Takahiro Machida | 2011-01-25 |
| RE37996 | Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor | Fumio Mizuno, Noboru Moriuchi, Masayuki Morita | 2003-02-18 |
| 6436220 | Process for the collective removal of resist material and side wall protective film | Eiji Toyoda, Makoto Namikawa, Kouichi Hashimoto | 2002-08-20 |
| 6329112 | Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens | Hiroshi Fukuda, Tsuneo Terasawa, Katsuya Hayano, Norio Hasegawa | 2001-12-11 |
| 5959011 | Resist removing method, and curable pressure-sensitive adhesive, adhesive sheets and apparatus used for the method | Fumio Mizuno, Noburu Moriuchi, Yutaka Moroishi, Makoto Sunakawa, Michirou Kawanishi | 1999-09-28 |
| 5736300 | Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor | Fumio Mizuno, Noboru Moriuchi, Masayuki Morita | 1998-04-07 |
| 5578422 | Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor | Fumio Mizuno, Noboru Moriuchi, Masayuki Morita | 1996-11-26 |
| 5466325 | Resist removing method, and curable pressure-sensitive adhesive, adhesive sheets and apparatus used for the method | Fumio Mizuno, Noboru Moriuchi, Yutaka Moroishi, Makoto Sunakawa, Michirou Kawanishi | 1995-11-14 |
| 5436095 | Manufacturing method or an exposing method for a semiconductor device for a semiconductor integrated circuit device and a mask used therefor | Fumio Mizuno, Noboru Moriuchi, Masayuki Morita | 1995-07-25 |
| 5405810 | Alignment method and apparatus | Fumio Mizuno, Noboru Moriuchi | 1995-04-11 |
| 4835089 | Resist pattern forming process with dry etching | Takao Iwayanagi, Norio Hasegawa, Toshihiko Tanaka, Hiroshi Shiraishi, Takumi Ueno +2 more | 1989-05-30 |