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System and method for critical dimension reduction and pitch reduction |
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2013-09-10 |
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Methods for controlling time scale of gas delivery into a processing chamber |
Gunsu Yun, Iqbal Shareef, Kurt M. Jorgensen |
2012-12-25 |
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Critical dimension reduction and roughness control |
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Critical dimension reduction and roughness control |
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Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof |
Cristian Paduraru, Alan J. Jensen, David Schaefer, Tom Choi |
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System and method for critical dimension reduction and pitch reduction |
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2008-09-23 |
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Sacrificial layer for protection during trench etch |
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2007-04-17 |
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2006-03-21 |
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Travis R. Taylor, Robert Luke Anderson |
2006-02-28 |
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2005-10-25 |
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2005-10-18 |
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