| 7022209 |
PVD method and PVD apparatus |
Winfried Sabisch, Alfred Kersch, Georg Schulze-Icking, Thomas Witke |
2006-04-04 |
| 6784553 |
Semiconductor device with self-aligned contact and method for manufacturing the device |
Bruno Spuler |
2004-08-31 |
| 6693022 |
CVD method of producing in situ-doped polysilicon layers and polysilicon layered structures |
Joerg Dreybrodt, Dirk Drescher, Stephan Wege |
2004-02-17 |
| 6479373 |
Method of structuring layers with a polysilicon layer and an overlying metal or metal silicide layer using a three step etching process with fluorine, chlorine, bromine containing gases |
Joerg Dreybrodt, Dirk Drescher, Stephan Wege |
2002-11-12 |
| 6362098 |
Plasma-enhanced chemical vapor deposition (CVD) method to fill a trench in a semiconductor substrate |
Terry A. Breeden, Iraj Shahvandi, Michael Tucker, Olivier Vatel, Karl Mautz |
2002-03-26 |
