Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE49732 | Charged particle lithography system with alignment sensor and beam measurement sensor | Paul IJmert Scheffers, Jan Andries Meijer, Erwin Slot, Vincent Sylvester Kuiper | 2023-11-21 |
| RE49241 | Lithography system and method for processing a target, such as a wafer | — | 2022-10-11 |
| 10054863 | Method of determining a position of a substrate in a lithography system, substrate for use in such a method, and lithography system for carrying out such method | Guido De Boer | 2018-08-21 |
| 9760028 | Lithography system and method for processing a target, such as a wafer | — | 2017-09-12 |
| 9690215 | Interferometer module | Guido De Boer, Thomas Adrian Ooms, Godefridus Cornelius Antonius Couweleers | 2017-06-27 |
| 9678443 | Lithography system with differential interferometer module | Guido De Boer, Thomas Adriaan Ooms, Godefridus Cornelius Antonius Couweleers | 2017-06-13 |
| 9665014 | Charged particle lithography system with alignment sensor and beam measurement sensor | Paul IJmert Scheffers, Jan Andries Meijer, Erwin Slot, Vincent Sylvester Kuiper | 2017-05-30 |
| 9551563 | Multi-axis differential interferometer | Godefridus Cornelius Antonius Couweleers, Thomas Adriaan Ooms | 2017-01-24 |
| 9484188 | Individual beam pattern placement verification in multiple beam lithography | — | 2016-11-01 |
| 9395635 | Position determination in a lithography system using a substrate having a partially reflective position mark | Guido De Boer | 2016-07-19 |
| 9395636 | Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer | Guido De Boer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg | 2016-07-19 |
| 9383662 | Lithography system for processing at least a part of a target | Guido De Boer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg | 2016-07-05 |
| 9261800 | Alignment of an interferometer module for use in an exposure tool | Guido De Boer, Thomas Adriaan Ooms, Godefridus Cornelius Antonius Couweleers | 2016-02-16 |
| 9201315 | Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system | Guido De Boer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg | 2015-12-01 |
| 9069265 | Interferometer module | Guido De Boer, Thomas Adrian Ooms, Godefridus Cornelius Antonius Couweleers | 2015-06-30 |
| 8841920 | Capacitive sensing system | Guido De Boer, Johnny Joannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Stijn Willem Herman Karel Steenbrink | 2014-09-23 |
| 8638109 | Capacitive sensing system with differential pairs | Guido De Boer, Johnny Joannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Stijn Willem Herman Karel Steenbrink | 2014-01-28 |
| 8570055 | Capacitive sensing system | Guido De Boer, Johnny Joannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Stijn Willem Herman Karel Steenbrink | 2013-10-29 |
| 8513959 | Integrated sensor system | Guido De Boer, Johnny Joannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Stijn Willem Herman Karel Steenbrink | 2013-08-20 |