Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10792711 | Substrate processing system, substrate cleaning method, and recording medium | Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Itaru Kanno +1 more | 2020-10-06 |
| 10272478 | Substrate processing system, substrate cleaning method, and recording medium | Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Itaru Kanno +1 more | 2019-04-30 |
| 10023827 | Cleaning composition for semiconductor substrate and cleaning method | Kenji Mochida | 2018-07-17 |
| 9926462 | Composition for forming liquid immersion upper layer film, and polymer | Kiyoshi Tanaka, Kazunori Kusabiraki, Takahiro Hayama | 2018-03-27 |
| 9818598 | Substrate cleaning method and recording medium | Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Itaru Kanno +1 more | 2017-11-14 |
| 9817311 | Resist pattern-forming method, substrate-processing method, and photoresist composition | Yuichiro Katsura, Ryu Matsumoto, Yuji Yada, Ken Nakakura | 2017-11-14 |
| 9540535 | Composition for forming liquid immersion upper layer film, and polymer | Kiyoshi Tanaka, Kazunori Kusabiraki, Takahiro Hayama | 2017-01-10 |
| 9417527 | Resist pattern-forming method, substrate-processing method, and photoresist composition | Yuichiro Katsura, Ryu Matsumoto, Yuji Yada, Ken Nakakura | 2016-08-16 |
| 8927200 | Double patterning method | Kanako MEYA, Takeo Shioya | 2015-01-06 |
| 8501389 | Upper layer-forming composition and resist patterning method | Kazunori Kusabiraki, Takahiro Hayama, Norihiko Sugie, Kiyoshi Tanaka | 2013-08-06 |
| 7144675 | Radiation-sensitive resin composition | Hiroyuki Ishii, Masafumi Yamamoto, Daichi Matsuda, Atsushi Nakamura | 2006-12-05 |
| 7078148 | Radiation sensitive resin composition | Hiroyuki Ishii, Atsushi Nakamura, Masafumi Yamamoto | 2006-07-18 |
| 6800419 | Radiation-sensitive resin composition | Akimasa Soyano, Hiroyuki Ishii, Hidemitsu Ishida, Yukio Nishimura | 2004-10-05 |