KY

Kosuke Yoshihara

TL Tokyo Electron Limited: 14 patents #474 of 5,567Top 9%
TL Tokyo Electron Kyushu Limited: 2 patents #49 of 104Top 50%
WI Wingarc1St: 2 patents #7 of 15Top 50%
Overall (All Time): #282,384 of 4,157,543Top 7%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
12216406 Coating method and coating apparatus Yusaku Hashimoto, Masatoshi Kawakita 2025-02-04
11938511 Coating method, coating apparatus and recording medium Masatoshi Kawakita, Yusaku Hashimoto 2024-03-26
11693319 Substrate processing method, substrate processing apparatus, and storage medium Keiichi Tanaka, Yoshihiro Kondo, Makoto Muramatsu, Teruhiko Kodama 2023-07-04
11407005 Coating method, coating apparatus and recording medium Masatoshi Kawakita, Yusaku Hashimoto 2022-08-09
11065639 Coating treatment method, computer storage medium and coating treatment apparatus Shogo Inaba, Shinichi Hatakeyama 2021-07-20
10666726 Data processing system, and program for managing data Jun Tanaka, Ko Shimazawa, Keisuke Tatehara 2020-05-26
9846715 Address/latitude and longitude converting device and geographical information system using the same Taiyo Kato, Ko Shimazawa 2017-12-19
8453599 Resist solution supply apparatus, resist solution supply method, and computer storage medium Yusuke Yamamoto 2013-06-04
6821550 Apparatus and method for applying process solution Masatoshi Deguchi 2004-11-23
6620244 Resist film forming method and resist coating apparatus 2003-09-16
6410194 Resist film forming method and resist coating apparatus 2002-06-25
6281145 Apparatus and method for applying process solution Masatoshi Deguchi 2001-08-28
6117486 Photoresist coating method and apparatus 2000-09-12
6004047 Method of and apparatus for processing photoresist, method of evaluating photoresist film, and processing apparatus using the evaluation method Masami Akimoto, Yuji Fukuda 1999-12-21
5826130 Apparatus and method for developing resist coated on substrate Hideya Tanaka, Norimitsu Morioka 1998-10-20
5689749 Apparatus for developing a resist-coated substrate Hideya Tanaka, Norimitsu Morioka 1997-11-18