Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10256073 | Charged particle beam writing method | — | 2019-04-09 |
| 9633820 | Method for forming resist film and charged particle beam writing method | Takayuki Ohnishi | 2017-04-25 |
| 9581893 | Mask manufacturing method, mask substrate, and charged beam drawing method | — | 2017-02-28 |
| 9147552 | Charged particle beam writing method and charged particle beam writing apparatus | Tomoo Motosugi, Satoshi Nakahashi | 2015-09-29 |
| 8367276 | Mask blank and method of manufacturing mask | Yasushi Okubo, Masahiro Hashimoto, Toshiyuki Suzuki, Takayuki Ohnishi, Hitoshi Sunaoshi +1 more | 2013-02-05 |
| 8133402 | Pattern forming method, charged particle beam writing apparatus, and recording medium on which program is recorded | Takayuki Ohnishi | 2012-03-13 |
| 6346354 | Pattern writing method | Takayuki Abe, Susumu Oogi, Mitsuko Shimizu, Hideo Inoue, Takashi Saito +5 more | 2002-02-12 |
| 6313476 | Charged beam lithography system | Mitsuko Shimizu, Takayuki Abe, Susumu Oogi, Takashi Kamikubo, Eiji Murakami +4 more | 2001-11-06 |
| 5885747 | Charged beam lithography method | Satoshi Yamasaki, Shuichi Tamamushi | 1999-03-23 |
| 5863682 | Charged particle beam writing method for determining optimal exposure dose prior to pattern drawing | Takayuki Abe, Susumu Oogi, Takashi Kamikubo | 1999-01-26 |