HL

Heon Lee

Infineon Technologies Ag: 9 patents #986 of 7,486Top 15%
IBM: 6 patents #16,453 of 70,183Top 25%
HE Hynix (Hyundai Electronics): 1 patents #731 of 1,604Top 50%
📍 Samcheok-si, CA: #4 of 6 inventorsTop 70%
Overall (All Time): #355,968 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
7153781 Method to etch poly Si gate stacks with raised STI structure Young Jin Park 2006-12-26
6838339 Area-efficient stack capacitor 2005-01-04
6753252 Contact plug formation for devices with stacked capacitors Youngjin Park, David E. Kotecki, Greg Costrini 2004-06-22
6573192 Dual thickness gate oxide fabrication method using plasma surface treatment 2003-06-03
6440793 Vertical MOSFET Ramachandra Divakaruni, Jack A. Mandelman, Carl Radens, Jai-Hoon Sim 2002-08-27
6414347 Vertical MOSFET Ramachandra Divakaruni, Jack A. Mandelman, Carl Radens, Jai-Hoon Sim 2002-07-02
6362033 Self-aligned LDD formation with one-step implantation for transistor formation Young Jin Park 2002-03-26
6355520 Method for fabricating 4F2 memory cells with improved gate conductor structure Youngjin Park 2002-03-12
6352934 Sidewall oxide process for improved shallow junction formation in support region 2002-03-05
6326260 Gate prespacers for high density, high performance DRAMs Ramachandra Divakaruni, James W. Adkisson, Mary E. Weybright, Scott D. Halle, Jeffrey P. Gambino 2001-12-04
6294436 Method for fabrication of enlarged stacked capacitors using isotropic etching Youngjin Park 2001-09-25
6284666 Method of reducing RIE lag for deep trench silicon etching Munir D. Naeem, Gangadhara S. Mathad, Byeong Y. Kim, Stephan Kudelka, Brian Lee +3 more 2001-09-04
6261924 Maskless process for self-aligned contacts Jack A. Mandelman, Young Jin Park 2001-07-17
5264391 Method of forming a self-aligned contact utilizing a polysilicon layer Gon Son, Soo-Sik Yoon, Dong-Duk Lee, Hae-Sung Park, Sea C. Kim 1993-11-23