| 8126027 |
Line narrowing module |
J. Martin Algots, Robert A. Bergstedt, William N. Partlo, Richard L. Sandstrom |
2012-02-28 |
| 7653095 |
Active bandwidth control for a laser |
Daniel J. Reiley, Robert A. Bergstedt |
2010-01-26 |
| 7643528 |
Immersion lithography laser light source with pulse stretcher |
William N. Partlo, Alexander I. Ershov, Igor V. Fomenkov, Daniel J. W. Brown, Christian J. Wittak +11 more |
2010-01-05 |
| 7366219 |
Line narrowing module |
J. Martin Algots, Robert A. Bergstedt, Walter Dale Gillespie, Vladimir Kulgeyko, William N. Partlo +3 more |
2008-04-29 |
| 7218661 |
Line selected F2 two chamber laser system |
David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, Eckehard D. Onkels, Herve A. Besaucele +8 more |
2007-05-15 |
| 7088758 |
Relax gas discharge laser lithography light source |
Richard L. Sandstrom, William N. Partlo, Daniel J. W. Brown, Thomas A. Yager, Alexander I. Ershov +1 more |
2006-08-08 |
| 7058107 |
Line selected F2 two chamber laser system |
David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, Eckehard D. Onkels, Herve A. Besaucele +8 more |
2006-06-06 |
| 6801560 |
Line selected F2 two chamber laser system |
David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, Eckehard D. Onkels, Herve A. Besaucele +8 more |
2004-10-05 |
| 6798812 |
Two chamber F2 laser system with F2 pressure based line selection |
Thomas Hofmann, Richard L. Sandstrom |
2004-09-28 |