Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7481695 | Polishing apparatus and methods having high processing workload for controlling polishing pressure applied by polishing head | Miguel Saldana | 2009-01-27 |
| 6976903 | Apparatus for controlling retaining ring and wafer head tilt for chemical mechanical polishing | — | 2005-12-20 |
| 6937915 | Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control | Rodney Kistler, David Hemker, Yehiel Gotkis, Aleksander Owczarz, Bruno Morel | 2005-08-30 |
| 6925348 | Methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control | Rodney Kistler, David Hemker, Yehiel Gotkis, Aleksander Owczarz, Bruno Morel | 2005-08-02 |
| 6843707 | Methods for aligning a surface of an active retainer ring with a wafer surface for chemical mechanical polishing | Miguel Saldana | 2005-01-18 |
| 6752703 | Chemical mechanical polishing apparatus and methods with porous vacuum chuck and perforated carrier film | John M. Boyd, Miguel Saldana | 2004-06-22 |
| 6719874 | Active retaining ring support | Yehiel Gotkis, Aleksander Owczarz, Miguel Saldana, David Wei | 2004-04-13 |
| 6709322 | Apparatus for aligning a surface of an active retainer ring with a wafer surface for chemical mechanical polishing | Miguel Saldana | 2004-03-23 |
| 6659116 | System for wafer carrier in-process clean and rinse | Glenn W. Travis | 2003-12-09 |
| 6652357 | Methods for controlling retaining ring and wafer head tilt for chemical mechanical polishing | — | 2003-11-25 |
| 6640155 | Chemical mechanical polishing apparatus and methods with central control of polishing pressure applied by polishing head | Miguel Saldana | 2003-10-28 |
| 6443815 | Apparatus and methods for controlling pad conditioning head tilt for chemical mechanical polishing | — | 2002-09-03 |