Issued Patents All Time
Showing 25 most recent of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12360063 | System and method for measuring a sample by x-ray reflectance scatterometry | Heath A. Pois, Bruno W. Schueler, Rodney Smedt, Jeffrey T. Fanton | 2025-07-15 |
| 12165863 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis | 2024-12-10 |
| 11996259 | Patterned x-ray emitting target | Bruce H. Newcome, Bruno W. Schueler | 2024-05-28 |
| 11874237 | System and method for measuring a sample by x-ray reflectance scatterometry | Heath A. Pois, Bruno Shueler, Rodney Smedt, Jeffrey T. Fanton | 2024-01-16 |
| 11823883 | Mass spectrometer detector and system and method using the same | Christopher F. Bevis, Yungman Alan Liu, Eli Cheifetz, Amit Weingarten, Alexander Kadyshevitch | 2023-11-21 |
| 11764050 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis | 2023-09-19 |
| 11430647 | Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry | Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis | 2022-08-30 |
| 11183377 | Mass spectrometer detector and system and method using the same | Christopher F. Bevis, Yungman Alan Liu, Eli Cheifetz, Amit Weingarten, Alexander Kadyshevitch | 2021-11-23 |
| 10910208 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis | 2021-02-02 |
| 10859519 | Methods and systems for measuring periodic structures using multi-angle x-ray reflectance scatterometry (XRS) | Heath A. Pois, Bruno W. Schueler, Rodney Smedt, Jeffrey T. Fanton | 2020-12-08 |
| 10636644 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis | 2020-04-28 |
| 10481112 | Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) | Heath A. Pois, Bruno W. Schueler, Rodney Smedt, Jeffrey T. Fanton | 2019-11-19 |
| 10403489 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis | 2019-09-03 |
| 10119925 | Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) | Heath A. Pois, Bruno W. Schueler, Rodney Smedt, Jeffrey T. Fanton | 2018-11-06 |
| 10056242 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | Bruno W. Schueler, Bruce H. Newcome, Rodney Smedt, Chris Bevis | 2018-08-21 |
| 9588066 | Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) | Heath A. Pois, Bruno W. Schueler, Rodney Smedt, Jeffrey T. Fanton | 2017-03-07 |
| 9297771 | Methods and systems for fabricating platelets of a monochromator for X-ray photoelectron spectroscopy | Jeffrey T. Fanton, Rodney Smedt, Bruno W. Schueler | 2016-03-29 |
| 9240254 | System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy | Bruno W. Schueler, Jeffrey T. Fanton, Rodney Smedt | 2016-01-19 |
| 9201030 | Method and system for non-destructive distribution profiling of an element in a film | Paola deCecco, Bruno W. Schueler, Michael Kwan, David S. Ballance | 2015-12-01 |
| 8916823 | Method and system for non-destructive distribution profiling of an element in a film | Paolo deCecco, Bruno W. Schueler, Michael Kwan, David S. Ballance | 2014-12-23 |
| 8610059 | Method and system for non-destructive distribution profiling of an element in a film | Paola deCecco, Bruno W. Schueler, Michael Kwan, David S. Ballance | 2013-12-17 |
| 8269167 | Method and system for non-destructive distribution profiling of an element in a film | Paola deCecco, Bruno W. Schueler, Michael Kwan, David S. Ballance | 2012-09-18 |
| 8011830 | Method and system for calibrating an X-ray photoelectron spectroscopy measurement | Bruno W. Schueler, Bruce H. Newcome, Jeffrey Allen Moore | 2011-09-06 |
| 7884321 | Method and system for non-destructive distribution profiling of an element in a film | Paola deCecco, Bruno W. Schueler, Michael Kwan, David S. Ballance | 2011-02-08 |
| 7411188 | Method and system for non-destructive distribution profiling of an element in a film | Paola deCecco, Bruno W. Schueler, Michael Kwan, Dave Ballance | 2008-08-12 |