DM

David Mordo

NS Novellus Systems: 12 patents #69 of 780Top 9%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
OR Ob Realty: 1 patents #17 of 29Top 60%
PT Processing Technologies: 1 patents #7 of 15Top 50%
Overall (All Time): #320,179 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
10192762 Systems and methods for detecting the existence of one or more environmental conditions within a substrate processing system Fareen Adeni Khaja 2019-01-29
9870937 High productivity deposition reactor comprising a gas flow chamber having a tapered gas flow space Mehrdad M. Moslehi, Karl-Josef Kramer, Jay Ashjaee, George D. Kamian, Takao Yonehara 2018-01-16
9659769 Tensile dielectric films using UV curing Bhadri N. Varadarajan, Sean Chang, James S. Sims, Guangquan Lu, Kevin J. Ilcisin +2 more 2017-05-23
8715788 Method to improve mechanical strength of low-K dielectric film using modulated UV exposure Ananda K. Bandyopadhyay, Seon-Mee Cho, Haiying Fu, Easwar Srinivasan 2014-05-06
8043667 Method to improve mechanical strength of low-K dielectric film using modulated UV exposure Ananda K. Bandyopadhyay, Seon-Mee Cho, Haiying Fu, Easwar Srinivasan 2011-10-25
7799705 Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups Qingguo Wu, Haiying Fu, David Craig Smith 2010-09-21
7781351 Methods for producing low-k carbon doped oxide films with low residual stress Qingguo Wu, Haiying Fu, Dong Niu, Ananda K. Bandyopadhyay 2010-08-24
7622400 Method for improving mechanical properties of low dielectric constant materials Keith Fox, Easwar Srinivasan, Qingguo Wu 2009-11-24
7611757 Method to improve mechanical strength of low-K dielectric film using modulated UV exposure Ananda K. Bandyopadhyay, Seon-Mee Cho, Haiying Fu, Easwar Srinivasan 2009-11-03
7473653 Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups Qingguo Wu, Haiying Fu, David Craig Smith 2009-01-06
7265061 Method and apparatus for UV exposure of low dielectric constant materials for porogen removal and improved mechanical properties Seon-Mee Cho, Easwar Srinivasan, Brian Lu 2007-09-04
7253125 Method to improve mechanical strength of low-k dielectric film using modulated UV exposure Ananda K. Bandyopadhyay, Seon-Mee Cho, Haiying Fu, Easwar Srinivasan 2007-08-07
7241704 Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups Qingguo Wu, Haiying Fu, David Craig Smith 2007-07-10
6214526 Semiconductor processing using antireflective layer having high wet etch rate Srinivasan Sundararajan, Kenneth P. MacWilliams 2001-04-10
5114242 Bichannel radiation detection method Arnon Gat 1992-05-19