Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8575292 | Hydroxyl-functional carbamoyl organosilicon compounds of low VOC and HAP generating potential, anti-corrosion and/or adhesion promoting coating composition containing same, environmentally benign method of coating metal therewith and resulting coated metal | Shiu-Chin H. Su, Suresh K. Rajaraman, Kendall L. Guyer, Eric R. Pohl | 2013-11-05 |
| 8501314 | Method of applying an anti-corrosion and/or adhesion promoting coating to a metal and resulting coated metal | Shiu-Chin H. Su | 2013-08-06 |
| 7989651 | Epoxysilanes, processes for their manufacture and curable compositions containing same | Shiu-Chin H. Su, Kendall L. Guyer, Eric R. Pohl | 2011-08-02 |
| 7964032 | Fluorine-free trisiloxane surfactant compositions for use in coatings and printing ink compositions | Suresh K. Rajaraman, Alain Lejeune, George A. Policello, Mark D. Leatherman, Wenqing Peng +1 more | 2011-06-21 |
| 7875318 | Method of applying an anti-corrosion and/or adhesion promoting coating to a metal and resulting coated metal | Shiu-Chin H. Su | 2011-01-25 |
| 7531031 | Copper (I) compounds useful as deposition precursors of copper thin films | Chongying Xu, Thomas H. Baum | 2009-05-12 |
| 7456488 | Porogen material | Chongying Xu, Thomas H. Baum | 2008-11-25 |
| 7439318 | Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin films | Ziyun Wang, Chongying Xu, Thomas H. Baum | 2008-10-21 |
| 7423166 | Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films | Tianniu Chen, Chongying Xu, Thomas H. Baum, Ravi Laxman | 2008-09-09 |
| 7399350 | Fluorine-free disiloxane surfactant compositions for use in coatings and printing ink compositions | Suresh K. Rajaraman, Alain Lejeune, George A. Policello, Mark D. Leatherman | 2008-07-15 |
| 7371880 | Copper (I) compounds useful as deposition precursors of copper thin films | Chongying Xu, Thomas H. Baum | 2008-05-13 |
| 7342295 | Porogen material | Chongying Xu, Thomas H. Baum | 2008-03-11 |
| 7241912 | Copper (I) compounds useful as deposition precursors of copper thin films | Chongying Xu, Thomas H. Baum | 2007-07-10 |
| 7189571 | Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin films | Ziyun Wang, Chongying Xu, Thomas H. Baum | 2007-03-13 |
| 7166732 | Copper (I) compounds useful as deposition precursors of copper thin films | Chongying Xu, Thomas H. Baum | 2007-01-23 |
| 7108771 | Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films | Chongying Xu, Thomas H. Baum, Ziyun Wang, James Lin, Scott L. Battle +1 more | 2006-09-19 |
| 7084080 | Silicon source reagent compositions, and method of making and using same for microelectronic device structure | Ziyun Wang, Chongying Xu, Thomas H. Baum, Brian L. Benac | 2006-08-01 |
| 7022864 | Ethyleneoxide-silane and bridged silane precursors for forming low k films | Chongying Xu, Thomas H. Baum, Steven M. Bilodeau, Jeffrey F. Roeder, Abigail Ebbing +1 more | 2006-04-04 |
| 7011716 | Compositions and methods for drying patterned wafers during manufacture of integrated circuitry products | Chongying Xu, Michael B. Korzenski, Thomas H. Baum, Eliodor G. Ghenciu | 2006-03-14 |