Issued Patents All Time
Showing 276–300 of 304 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7153734 | CMOS device with metal and silicide gate electrodes and a method for making it | Justin K. Brask, Mark L. Doczy, Jack T. Kavalieros, Chris Barns, Uday Shah +3 more | 2006-12-26 |
| 7153784 | Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode | Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Uday Shah, Chris Barns +3 more | 2006-12-26 |
| 7148099 | Reducing the dielectric constant of a portion of a gate dielectric | Suman Datta, Jack T. Kavalieros, Mark L. Doczy, Justin K. Brask, Robert S. Chau | 2006-12-12 |
| 7148548 | Semiconductor device with a high-k gate dielectric and a metal gate electrode | Mark L. Doczy, Jack T. Kavalieros, Justin K. Brask, Suman Datta, Robert S. Chau | 2006-12-12 |
| 7144783 | Reducing gate dielectric material to form a metal gate electrode extension | Suman Datta, Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Robert S. Chau | 2006-12-05 |
| 7138316 | Semiconductor channel on insulator structure | Been-Yih Jin, Brian S. Doyle, Scott A. Hareland, Mark L. Doczy, Boyan Boyanov +3 more | 2006-11-21 |
| 7138323 | Planarizing a semiconductor structure to form replacement metal gates | Jack T. Kavalieros, Justin K. Brask, Mark L. Doczy, Uday Shah, Chris Barns +2 more | 2006-11-21 |
| 7129182 | Method for etching a thin metal layer | Justin K. Brask, Mark L. Doczy, Jack T. Kavalieros, Uday Shah, Robert S. Chau +1 more | 2006-10-31 |
| 7125762 | Compensating the workfunction of a metal gate transistor for abstraction by the gate dielectric layer | Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Suman Datta, Uday Shah +1 more | 2006-10-24 |
| 7126199 | Multilayer metal gate electrode | Mark L. Doczy, Justin K. Brask, Jack T. Kavalieros, Chris Barns, Suman Datta +1 more | 2006-10-24 |
| 7101761 | Method of fabricating semiconductor devices with replacement, coaxial gate structure | Robert S. Chau, Scott A. Hareland, Justin K. Brask | 2006-09-05 |
| 7091129 | Atomic layer deposition using photo-enhanced bond reconfiguration | Robert S. Chau, Scott A. Hareland | 2006-08-15 |
| 7087476 | Using different gate dielectrics with NMOS and PMOS transistors of a complementary metal oxide semiconductor integrated circuit | Suman Datta, Jack T. Kavalieros, Mark L. Doczy, Justin K. Brask, Robert S. Chau | 2006-08-08 |
| 7084038 | Method for making a semiconductor device having a high-k gate dielectric | Mark L. Doczy, Gilbert Dewey, Suman Datta, Sangwoo Pae, Justin K. Brask +4 more | 2006-08-01 |
| 7074680 | Method for making a semiconductor device having a high-k gate dielectric | Mark L. Doczy, Gilbert Dewey, Suman Datta, Sangwoo Pae, Justin K. Brask +4 more | 2006-07-11 |
| 7064066 | Method for making a semiconductor device having a high-k gate dielectric and a titanium carbide gate electrode | Suman Datta, Mark L. Doczy, Jack T. Kavalieros, Justin K. Brask, Robert S. Chau | 2006-06-20 |
| 7060568 | Using different gate dielectrics with NMOS and PMOS transistors of a complementary metal oxide semiconductor integrated circuit | Suman Datta, Jack T. Kavalieros, Mark L. Doczy, Justin K. Brask, Robert S. Chau | 2006-06-13 |
| 7045428 | Method for making a semiconductor device with a high-k gate dielectric and a conductor that facilitates current flow across a P/N junction | Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Uday Shah, Chris Barns +3 more | 2006-05-16 |
| 7037845 | Selective etch process for making a semiconductor device having a high-k gate dielectric | Justin K. Brask, Uday Shah, Mark L. Doczy, Jack T. Kavalieros, Robert S. Chau +1 more | 2006-05-02 |
| 7018549 | Method of fabricating multiple nanowires of uniform length from a single catalytic nanoparticle | Scott A. Hareland, Robert S. Chau | 2006-03-28 |
| 6974764 | Method for making a semiconductor device having a metal gate electrode | Justin K. Brask, Mark L. Doczy, Jack T. Kavalieros, Uday Shah, Robert S. Chau +1 more | 2005-12-13 |
| 6939815 | Method for making a semiconductor device having a high-k gate dielectric | Justin K. Brask, Mark L. Doczy, Scott A. Hareland, John Barnak, Jack T. Kavalieros +1 more | 2005-09-06 |
| 6893927 | Method for making a semiconductor device with a metal gate electrode | Uday Shah, Mark L. Doczy, Justin K. Brask, Jack T. Kavalieros, Robert S. Chau | 2005-05-17 |
| 6887800 | Method for making a semiconductor device with a high-k gate dielectric and metal layers that meet at a P/N junction | Suman Datta, Jack T. Kavalieros, Mark L. Doczy, Justin K. Brask, Uday Shah +1 more | 2005-05-03 |
| 6869889 | Etching metal carbide films | Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Suman Datta, Uday Shah +2 more | 2005-03-22 |