Issued Patents All Time
Showing 426–450 of 496 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8963280 | Semiconductor devices and methods of manufacture | — | 2015-02-24 |
| 8946791 | Finfet with reduced parasitic capacitance | Veeraraghavan S. Basker, Tenko Yamashita | 2015-02-03 |
| 8940602 | Self-aligned structure for bulk FinFET | Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh | 2015-01-27 |
| 8927312 | Method of fabricating MEMS transistors on far back end of line | Leland Chang, Guy M. Cohen, Michael A. Guillorn, Fei Liu, Ghavam G. Shahidi | 2015-01-06 |
| 8916445 | Semiconductor devices and methods of manufacture | — | 2014-12-23 |
| 8912056 | Dual epitaxial integration for FinFETS | Veeraraghavan S. Basker, Xinhui Wang, Tenko Yamashita | 2014-12-16 |
| 8912030 | Method for radiation monitoring | Jin Cai, Tak H. Ning, Jeng-Bang Yau | 2014-12-16 |
| 8895995 | Lateral silicon-on-insulator bipolar junction transistor radiation dosimeter | Jin Cai, Tak H. Ning, Jeng-Bang Yau | 2014-11-25 |
| 8877525 | Low cost secure chip identification | Dirk Pfeiffer | 2014-11-04 |
| 8859381 | Field-effect transistor (FET) with source-drain contact over gate spacer | Kevin K. Chan, Wilfried E. Haensch, Min Yang | 2014-10-14 |
| 8860112 | finFET eDRAM strap connection structure | Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh | 2014-10-14 |
| 8859355 | Method to make dual material finFET on same substrate | — | 2014-10-14 |
| 8853084 | Self-adjusting gate hard mask | — | 2014-10-07 |
| 8841716 | Retrograde substrate for deep trench capacitors | Veeraraghavan S. Basker, Wilfried E. Haensch, Tenko Yamashita, Chun-Chen Yeh | 2014-09-23 |
| 8841726 | Self-adjusting gate hard mask | — | 2014-09-23 |
| 8835249 | Retrograde substrate for deep trench capacitors | Veeraraghavan S. Basker, Wilfried E. Haensch, Tenko Yamashita, Chun-Chen Yeh | 2014-09-16 |
| 8815668 | Preventing FIN erosion and limiting Epi overburden in FinFET structures by composite hardmask | Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh | 2014-08-26 |
| 8815661 | MIM capacitor in FinFET structure | Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh | 2014-08-26 |
| 8816420 | MIM capacitor in finFET structure | Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh | 2014-08-26 |
| 8815670 | Preventing Fin erosion and limiting EPI overburden in FinFET structures by composite hardmask | Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh | 2014-08-26 |
| 8802512 | Overlap capacitance nanowire | — | 2014-08-12 |
| 8779490 | DRAM with dual level word lines | Babar A. Khan | 2014-07-15 |
| 8748252 | Replacement metal gate transistors using bi-layer hardmask | William J. Cote, Laertis Economikos, Young-Hee Kim, Dae-Gyu Park, Theodorus E. Standaert +3 more | 2014-06-10 |
| 8723262 | SOI FinFET with recessed merged fins and liner for enhanced stress coupling | Veeraraghavan S. Basker, Huiming Bu, Theodorus E. Standaert, Tenko Yamashita, Chun-Chen Yeh | 2014-05-13 |
| 8722494 | Dual gate finFET devices | Veeraraghavan S. Basker, Tenko Yamashita | 2014-05-13 |