Issued Patents All Time
Showing 26–50 of 60 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5932395 | Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices | Tsuneo Terasawa, Akira Imai, Norio Hasegawa, Shinji Okazaki | 1999-08-03 |
| 5902705 | Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices | Tsuneo Terasawa, Akira Imai, Norio Hasegawa, Shinji Okazaki | 1999-05-11 |
| 5837423 | Semiconductor IC device fabricating method | — | 1998-11-17 |
| 5830606 | Mask for manufacturing semiconductor device and method of manufacture thereof | — | 1998-11-03 |
| 5786112 | Photomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomask | Yasuhiro Koizumi | 1998-07-28 |
| 5757409 | Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus | Haruo Yoda, Ikuo Takada, Yukinobu Shibata, Akira Hirakawa, Norio Saitou +2 more | 1998-05-26 |
| 5753416 | Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process | Noboru Moriuchi | 1998-05-19 |
| 5691115 | Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices | Tsuneo Terasawa, Akira Imai, Norio Hasegawa, Shinji Okazaki | 1997-11-25 |
| 5667941 | Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process | Noboru Moriuchi | 1997-09-16 |
| 5654230 | Method of forming doped film | Shinichi Jintate, Toshiharu Nishimura, Atsushi Hosaka | 1997-08-05 |
| 5643698 | Mask for manufacturing semiconductor device and method of manufacture thereof | — | 1997-07-01 |
| 5641715 | Semiconductor IC device fabricating method | — | 1997-06-24 |
| 5631108 | Mask for manufacturing semiconductor device and method of manufacture thereof | — | 1997-05-20 |
| 5557314 | Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus | Haruo Yoda, Ikuo Takada, Yukinobu Shibata, Akira Hirakawa, Norio Saitou +2 more | 1996-09-17 |
| RE35315 | Mask for manufacturing semiconductor device and method of manufacture thereof | — | 1996-08-20 |
| 5521033 | Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process | — | 1996-05-28 |
| 5502001 | Method of forming light beam and method of fabricating semiconductor integrated circuits | — | 1996-03-26 |
| 5484671 | Mask for manufacturing semiconductor device and method of manufacture thereof | — | 1996-01-16 |
| 5455144 | Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process | Noboru Moriuchi | 1995-10-03 |
| 5418092 | Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process | — | 1995-05-23 |
| 5411823 | Exposure method, phase shift mask used in the same, and process of fabricating semiconductor integrated circuit device using the same | — | 1995-05-02 |
| 5386623 | Process for manufacturing a multi-chip module | Hideyuki Yamada | 1995-02-07 |
| 5358807 | Mask for manufacturing semiconductor device and method of manufacture thereof | — | 1994-10-25 |
| 5352550 | Mask for manufacturing semiconductor devices and method of manufacture thereof | — | 1994-10-04 |
| 5350649 | Mask for manufacturing semiconductor device and method of manufacture thereof | — | 1994-09-27 |