Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9011601 | Substrate processing apparatus | Naonori Akae, Yoshiro Hirose, Yushin Takasawa | 2015-04-21 |
| 8901014 | Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus and non-transitory computer readable recording medium | Naonori Akae, Yoshiro Hirose, Ryota Sasajima | 2014-12-02 |
| 8809204 | Method of manufacturing semiconductor device and substrate processing apparatus | Naonori Akae, Yoshiro Hirose, Yushin Takasawa | 2014-08-19 |
| 8575042 | Method of manufacturing semiconductor device and method of processing substrate and substrate processing apparatus | Yoshiro Hirose, Atsushi Sano, Osamu Kasahara, Kazuyuki Okuda, Kiyohiko Maeda | 2013-11-05 |
| 8415258 | Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus | Naonori Akae, Yoshiro Hirose, Yushin Takasawa, Ryota Sasajima | 2013-04-09 |
| 8410003 | Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus | Yoshiro Hirose, Naonari Akae, Yushin Takasawa | 2013-04-02 |
| 8367557 | Method of forming an insulation film having low impurity concentrations | Naonori Akae, Yoshiro Hirose, Yushin Takasawa | 2013-02-05 |
| 8252701 | Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus | Ryota Sasajima, Yoshiro Hirose, Naonori Akae, Kojiro Yokozawa | 2012-08-28 |
| 8202809 | Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus | Naonori Akae, Yushin Takasawa, Yoshiro Hirose | 2012-06-19 |
| 8174190 | Dispersion liquid for near-infrared-absorbing adhesive-body, near-infrared-absorbing adhesive body, near-infrared-absorbing plasma-display-panel filter, and plasma display panel | Atsushi Tofuku | 2012-05-08 |
| 8076251 | Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus | Naonori Akae, Yoshiro Hirose, Yushin Takasawa, Ryota Sasajima | 2011-12-13 |