Issued Patents All Time
Showing 26–50 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8937281 | Method for examining a sample by using a charged particle beam | Yan Zhao, Wei Fang | 2015-01-20 |
| 8923601 | Method for inspecting overlay shift defect during semiconductor manufacturing and apparatus thereof | Wei Fang, Hong Xiao | 2014-12-30 |
| 8884224 | Charged particle beam imaging assembly and imaging method thereof | Wei Fang, Yan Zhao | 2014-11-11 |
| 8805054 | Method and system of classifying defects on a wafer | Wei Fang, Zhao-Li Zhang | 2014-08-12 |
| 8791414 | Dynamic focus adjustment with optical height detection apparatus in electron beam system | Joe Wang, Van-Duc Nguyen, Yi Wang, Zhongwei Chen | 2014-07-29 |
| 8748815 | Method and system for detecting or reviewing open contacts on a semiconductor device | Frederick Y. Zhao | 2014-06-10 |
| 8748814 | Structure for inspecting defects in word line array fabricated by SADP process and method thereof | Hong Xiao | 2014-06-10 |
| 8712184 | Method and system for filtering noises in an image scanned by charged particles | Chad Liao, Futang Peng, Chuan Li, Alina Wang, Zhao-Li Zhang +1 more | 2014-04-29 |
| 8692214 | Charged particle beam inspection method | Yan Zhao | 2014-04-08 |
| 8606017 | Method for inspecting localized image and system thereof | Wei Fang, Zhao-Li Zhang | 2013-12-10 |
| 8432441 | Method and system for measuring critical dimension and monitoring fabrication uniformity | Wei Fang, Hong Xiao | 2013-04-30 |
| 8299431 | Method for examining a sample by using a charged particle beam | Yan Zhao, Wei Fang | 2012-10-30 |
| 8294094 | Method and apparatus for reducing substrate edge effect during inspection | Yan Zhao, Yi Wang | 2012-10-23 |
| 8094924 | E-beam defect review system | Zhongwei Chen, Yi Wang, Chung-Shih Pan, Joe Wang, Xuedong Liu +2 more | 2012-01-10 |
| 8089297 | Structure and method for determining a defect in integrated circuit manufacturing process | Hong Xiao, Chang-Chun Yeh | 2012-01-03 |
| 8068662 | Method and system for determining a defect during charged particle beam inspection of a sample | Zhao-Li Zhang, Wei Fang | 2011-11-29 |
| 8055059 | Method and system for determining a defect during sample inspection involving charged particle beam imaging | Wei Fang | 2011-11-08 |
| 8050490 | Method for inspecting overlay shift defect during semiconductor manufacturing and apparatus thereof | Hong Xiao, Wei Fang | 2011-11-01 |
| 8010307 | In-line overlay measurement using charged particle beam system | Wei Fang, Hong Xiao | 2011-08-30 |
| 7973283 | Method for regulating scanning sample surface charge in continuous and leap-and-scan scanning mode imaging process | Joe Wang | 2011-07-05 |
| 7919760 | Operation stage for wafer edge inspection and review | Hong Xiao, Joe Wang, Zhongwei Chen, Yi Wang, Edward Tseng | 2011-04-05 |
| 7884334 | Charged particle beam imaging method and system thereof | Yan Zhao | 2011-02-08 |
| 7474001 | Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturing | Yan Zhao, Chang-Chun Yeh, Zhong-Wei Chen | 2009-01-06 |
| 7105436 | Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturing | Yan Zhao, Chang-Chun Yeh, Zhong-Wei Chen | 2006-09-12 |
| 6881956 | Method and apparatus for scanning semiconductor wafers using a scanning electron microscope | Zhongwei Chen | 2005-04-19 |