Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6200724 | Chemical amplification resist compositions and process for the formation of resist patterns | Ei Yano, Keiji Watanabe, Koji Nozaki, Miwa Igarashi, Yoko Kuramitsu | 2001-03-13 |
| 6200725 | Chemically amplified resist compositions and process for the formation of resist patterns | Satoshi Takechi, Akiko Kotachi, Koji Nozaki, Ei Yano, Keiji Watanabe +3 more | 2001-03-13 |
| 6052261 | Method for manufacturing magnetoresistance head | Keiji Watanabe, Koji Nozaki, Miwa Igarashi, Yoko Kuramitsu, Ei Yano +4 more | 2000-04-18 |
| 6013416 | Chemically amplified resist compositions and process for the formation of resist patterns | Koji Nozaki, Ei Yano, Keiji Watanabe, Miwa Igarashi, Yoko Kuramitsu +3 more | 2000-01-11 |
| 5968713 | Chemically amplified resist compositions and process for the formation of resist patterns | Koji Nozaki, Ei Yano, Keiji Watanabe, Miwa Igarashi, Yoko Kuramitsu +3 more | 1999-10-19 |
| 5962191 | Resist compositions for forming resist patterns | Koji Nozaki, Ei Yano, Keiji Watanabe, Miwa Igarashi, Yoko Kuramitsu | 1999-10-05 |
| 5910392 | Resist composition, a process for forming a resist pattern and a process for manufacturing a semiconductor device | Koji Nozaki, Ei Yano, Keiji Watanabe, Miwa Igarashi | 1999-06-08 |
| 5824452 | Resist compositions and process for the formation of resist patterns | Koji Nozaki, Ei Yano, Keiji Watanabe, Miwa Igarashi, Yoko Kuramitsu | 1998-10-20 |
| 5804354 | Composition for forming conductivity imparting agent and pattern forming method | Keiji Watanabe, Yasuhiro Yoneda, Takashi Maruyama, Keiko Yano, Tomio Nakamura +5 more | 1998-09-08 |
| 5776659 | Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer | Keiji Watanabe, Ei Yano, Keiko Yano, Takashi Maruyama, Tomio Nakamura +4 more | 1998-07-07 |
| 5633121 | Method for examining surface of copper layer in circuit board and process for producing circuit board | Yasuo Yamagishi, Ei Yano | 1997-05-27 |
| 5484687 | Polysilphenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof | Keiji Watanabe, Akira Oikawa, Shun-ichi Fukuyama, Masaaki Yamagami | 1996-01-16 |
| 5482174 | Method for removing copper oxide on the surface of a copper film and a method for patterning a copper film | Yasuo Yamagishi, Ei Yano | 1996-01-09 |
| 5240813 | Polysilphenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof | Keiji Watanabe, Akira Oikawa, Shun-ichi Fukuyama, Masaaki Yamagami | 1993-08-31 |