Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8624205 | Charged particle beam writing apparatus and device production method | Yoshio Suzaki, Masamichi Kuwabara | 2014-01-07 |
| 6407397 | Charged particle beam exposure apparatus | — | 2002-06-18 |
| 6399954 | Charged-particle beam lithography apparatus and system capable of readily detecting abnormality in controlling on-off operation | Atsushi Saito, Hidefumi Yabara | 2002-06-04 |
| 6242751 | Charged-particle-beam exposure device and charged-particle-beam exposure method | Akio Takemoto, Yoshihisa Ooaeh, Tomohiko Abe, Hiroshi Yasuda, Takamasa Satoh +7 more | 2001-06-05 |
| 5969365 | Charged-particle-beam exposure device and charged-particle-beam exposure method | Akio Takemoto, Yoshihisa Ooaeh, Tomohiko Abe, Hiroshi Yasuda, Takamasa Satoh +7 more | 1999-10-19 |
| 5965895 | Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Hisayasu Nishino +8 more | 1999-10-12 |
| 5757015 | Charged-particle-beam exposure device and charged-particle-beam exposure method | Akio Takemoto, Yoshihisa Ooaeh, Tomohiko Abe, Hiroshi Yasuda, Takamasa Satoh +7 more | 1998-05-26 |
| 5721432 | Method of and system for charged particle beam exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Hisayasu Nishino +8 more | 1998-02-24 |
| 5719402 | Method of and system for charged particle beam exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Hisayasu Nishino +8 more | 1998-02-17 |
| 5546319 | Method of and system for charged particle beam exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Hisayasu Nishino +8 more | 1996-08-13 |