Issued Patents All Time
Showing 426–450 of 600 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5818081 | Semiconductor device | Tadashi Shibata, Hideo Kosaka, Takeo Yamashita | 1998-10-06 |
| 5806543 | Wet station, and method of and apparatus for wet cleaning using said wet station | — | 1998-09-15 |
| 5803956 | Surface treating composition for micro processing | Matagoro Maeno, Hirohisa Kikuyama | 1998-09-08 |
| 5803974 | Chemical vapor deposition apparatus | Nobuo Mikoshiba, Kazuo Tsubouchi, Kazuya Masu, Nobumasa Suzuki | 1998-09-08 |
| 5789086 | Stainless steel surface having passivation film | — | 1998-08-04 |
| 5784018 | Semiconductor circuit | Takeo Yamashita, Tadashi Shibata | 1998-07-21 |
| 5783790 | Wet treatment method | Kenichi Mitsumori, Yasuhiko Kasama, Koji Yamanaka, Takashi Imaoka | 1998-07-21 |
| 5769110 | Fluid control apparatus | Keiji Hirao, Michio Yamaji, Shigeru Itoi, Tsutomu Shinohara, Nobukazu Ikeda +2 more | 1998-06-23 |
| 5759214 | Nitrogen gas supply system | Yoshio Ishihara | 1998-06-02 |
| 5753320 | Process for forming deposited film | Nobuo Mikoshiba, Kazuo Tsubouchi, Kazuya Masu, Nobumasa Suzuki | 1998-05-19 |
| 5750011 | Apparatus and method for producing gaseous ions by use of x-rays, and various apparatuses and structures using them | Hitoshi Inaba, Tomoyuki Ikedo | 1998-05-12 |
| 5745416 | Non-volatile semiconductor memory device | Tadashi Shibata, Yuichiro Yamashita | 1998-04-28 |
| 5728278 | Plasma processing apparatus | Nobuyuki Okamura, Atsushi Yamagami, Haruhiro Harry Goto, Tadashi Shibata | 1998-03-17 |
| 5725907 | Metal material formed with fluorocarbon film, process for preparing the material and apparatus made with use of the material | Kazuo Chiba, Hideo Kume, Yutaka Mikasa, Matagoro Maeno, Yoshinori Nakagawa +2 more | 1998-03-10 |
| 5720505 | Pipe joint | Michio Yamaji, Nobukazu Ikeda, Tsutomu Shinohara, Kazuhiro Yoshikawa, Tetsuya Kojima | 1998-02-24 |
| 5719520 | Multi-valued ROM circuit #7 | Rita Wai-Chi Au, Tadashi Shibata | 1998-02-17 |
| 5714795 | Semiconductor device utilizing silicide reaction | Hiroshi Suzuki, Masaki Hirayama | 1998-02-03 |
| 5714407 | Etching agent, electronic device and method of manufacturing the device | Matagoro Maeno, Masayuki Miyashita, Hirohisa Kikuyama, Tatsuhiro Yabune, Jun Takano +5 more | 1998-02-03 |
| 5711197 | Tube facing machine | Eiji Ideta, Akihiro Morimoto | 1998-01-27 |
| 5706403 | Semiconductor neural circuit device | Tadashi Shibata | 1998-01-06 |
| 5703488 | Instrument for measuring plasma excited by high-frequency | Masaki Hirayama | 1997-12-30 |
| 5688330 | Process apparatus | — | 1997-11-18 |
| 5683072 | Thin film forming equipment | Tadashi Shibata, Masaru Umeda | 1997-11-04 |
| 5684738 | Analog semiconductor memory device having multiple-valued comparators and floating-gate transistor | Rita Wai-Chi Au, Tadashi Shibata | 1997-11-04 |
| 5682109 | Semiconductor integrated circuit | Tadashi Shibata, Koji Kotani | 1997-10-28 |