Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8134419 | Digital high-frequency generator circuit | Kazuo Nakano, Syuhei Amakawa, Noboru Ishihara | 2012-03-13 |
| 7504587 | Parallel wiring and integrated circuit | Kenichi Okada, Hiroyuki Ito | 2009-03-17 |
| 7071806 | Variable inductor and method for adjusting inductance of same | Akira Shimokohbe, Seiichi Hata, Yoshio Satoh, Fumio Yamagishi | 2006-07-04 |
| 6865174 | Code division multiple access communication system | Kazuo Tsubouchi, Tomohiko Shibata | 2005-03-08 |
| 6495461 | Process for forming amorphous titanium silicon nitride on substrate | Kazuo Tsubouchi, Hideki Matsuhashi | 2002-12-17 |
| 6333925 | Code division multiplex communications system | Kazuo Tsubouchi, Yasuhito Fujita | 2001-12-25 |
| 6201800 | Code division multiplex communications system | Kazuo Tsubouchi, Yasuhito Fujita | 2001-03-13 |
| 5824150 | Process for forming deposited film by use of alkyl aluminum hydride | Nobuo Mikoshiba, Kazuo Tsubouchi | 1998-10-20 |
| 5803974 | Chemical vapor deposition apparatus | Nobuo Mikoshiba, Tadahiro Ohmi, Kazuo Tsubouchi, Nobumasa Suzuki | 1998-09-08 |
| 5779804 | Gas feeding device for controlled vaporization of an organanometallic compound used in deposition film formation | Nobuo Mikoshiba, Kazuo Tsubouchi | 1998-07-14 |
| 5766682 | Process for chemical vapor deposition of a liquid raw material | Kazuo Tsubouchi | 1998-06-16 |
| 5755885 | Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation | Nobuo Mikoshiba, Kazuo Tsubouchi | 1998-05-26 |
| 5753320 | Process for forming deposited film | Nobuo Mikoshiba, Tadahiro Ohmi, Kazuo Tsubouchi, Nobumasa Suzuki | 1998-05-19 |
| 5604153 | Process for thin film formation | Kazuo Tsubouchi | 1997-02-18 |
| 5602424 | Semiconductor circuit device wiring with F.C.C. structure, plane oriention (100) and aligned with the current direction | Kazuo Tsubouchi, Tadahiro Ohmi, Yohei Hiura | 1997-02-11 |
| 5476547 | Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation | Nobuo Mikoshiba, Kazuo Tsubouchi | 1995-12-19 |
| 5421895 | Apparatus for vaporizing liquid raw material and apparatus for forming thin film | Kazuo Tsubouchi | 1995-06-06 |
| 5393699 | Deposited film formation method utilizing selective deposition by use of alkyl aluminum hydride | Nobuo Mikoshiba, Kazuo Tsubouchi | 1995-02-28 |
| 5364664 | Process for non-selectively forming deposition film on a non-electron-donative surface | Kazuo Tsubouchi | 1994-11-15 |
| 5328873 | Process for forming deposited film by use of alkyl aluminum hydride | Nobuo Mikoshiba, Kazuo Tsubouchi | 1994-07-12 |
| 5316972 | Process for forming deposited film by use of alkyl aluminum hydride and process for preparing semiconductor device | Nobuo Mikoshiba, Kazuo Tsubouchi | 1994-05-31 |
| 5245207 | Integrated circuit | Nobuo Mikoshiba, Kazuo Tsubouchi | 1993-09-14 |
| 5208187 | Metal film forming method | Kazuo Tsubouchi | 1993-05-04 |
| 5196372 | Process for forming metal deposited film containing aluminum as main component by use of alkyl hydride | Nobuo Mikoshiba, Kazuo Tsubouchi | 1993-03-23 |
| 5180687 | Deposited film formation method utilizing selective deposition by use of alkyl aluminum hydride | Nobuo Mikoshiba, Kazuo Tsubouchi | 1993-01-19 |