Stanislav Kadlec — 18 Patents at Evatec Ag

Stanislav Kadlec has been granted 18 US patents while listed as an inventor at Evatec Ag. The first was granted in 1993 and the most recent in December 2023. Stanislav Kadlec ranks #245,716 of 4,157,543 US inventors in our database (top 5.9%). Patent records list Stanislav Kadlec in Praha, CZ.

Issued Patents All Time

Showing 1–18 of 18 patents

Patent #	Title	Co-Inventors	Date
11842871	Low voltage MEMS relay filled with alternative gas mixture to SF6	Sandy Omar Jimenez Gonzalez, Venkat raman Thenkarai Narayanan, Mykhailo Gnybida, Christian Ruempler	2023-12-12
11380530	Reactive sputtering with HIPIMS	Juergen Weichart, Mohamed Elghazzali	2022-07-05
11211234	Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)	Jurgen Weichart	2021-12-28
10784092	Reactive sputtering with HIPIMs	Juergen Weichart, Mohamed Elghazzali	2020-09-22
10692707	RF substrate bias with high power impulse magnetron sputtering (HIPIMS)	Jurgen Weichart	2020-06-23
9611537	Target shaping	Jurgen Weichart	2017-04-04
9587306	Method for producing a directional layer by cathode sputtering, and device for implementing the method	Hartmut Rohrmann, Hanspeter Friedli, Jurgen Weichart, Martin Dubs	2017-03-07
9355824	Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)	Jurgen Weichart	2016-05-31
8574409	Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source	Frantisek Balon, Juergen Weichart, Bart Scholte van Mast	2013-11-05
8475634	Application of HIPIMS to through silicon via metallization in three-dimensional wafer packaging	Jurgen Weichart	2013-07-02
8435389	RF substrate bias with high power impulse magnetron sputtering (HIPIMS)	Jurgen Weichart	2013-05-07
8246794	Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source	Frantisek Balon, Juergen Weichart, Bart Scholte van Mast	2012-08-21
7718042	Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source	Eduard Kugler, Walter Haag	2010-05-18
7429543	Method for the production of a substrate	Eduard Kugler, Thomas Halter	2008-09-30
7138343	Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber	Eduard Kugler, Thomas Halter	2006-11-21
6860977	Method for manufacturing a workpiece using a magnetron sputter source	Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag +1 more	2005-03-01
6682637	Magnetron sputter source	Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag +1 more	2004-01-27
5234560	Method and device for sputtering of films	Jindrich Musil	1993-08-10

Stanislav Kadlec — 18 Patents

Issued Patents All Time

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