Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11842871 | Low voltage MEMS relay filled with alternative gas mixture to SF6 | Sandy Omar Jimenez Gonzalez, Venkat raman Thenkarai Narayanan, Mykhailo Gnybida, Christian Ruempler | 2023-12-12 |
| 11380530 | Reactive sputtering with HIPIMS | Juergen Weichart, Mohamed Elghazzali | 2022-07-05 |
| 11211234 | Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS) | Jurgen Weichart | 2021-12-28 |
| 10784092 | Reactive sputtering with HIPIMs | Juergen Weichart, Mohamed Elghazzali | 2020-09-22 |
| 10692707 | RF substrate bias with high power impulse magnetron sputtering (HIPIMS) | Jurgen Weichart | 2020-06-23 |
| 9611537 | Target shaping | Jurgen Weichart | 2017-04-04 |
| 9587306 | Method for producing a directional layer by cathode sputtering, and device for implementing the method | Hartmut Rohrmann, Hanspeter Friedli, Jurgen Weichart, Martin Dubs | 2017-03-07 |
| 9355824 | Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS) | Jurgen Weichart | 2016-05-31 |
| 8574409 | Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source | Frantisek Balon, Juergen Weichart, Bart Scholte van Mast | 2013-11-05 |
| 8475634 | Application of HIPIMS to through silicon via metallization in three-dimensional wafer packaging | Jurgen Weichart | 2013-07-02 |
| 8435389 | RF substrate bias with high power impulse magnetron sputtering (HIPIMS) | Jurgen Weichart | 2013-05-07 |
| 8246794 | Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source | Frantisek Balon, Juergen Weichart, Bart Scholte van Mast | 2012-08-21 |
| 7718042 | Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source | Eduard Kugler, Walter Haag | 2010-05-18 |
| 7429543 | Method for the production of a substrate | Eduard Kugler, Thomas Halter | 2008-09-30 |
| 7138343 | Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber | Eduard Kugler, Thomas Halter | 2006-11-21 |
| 6860977 | Method for manufacturing a workpiece using a magnetron sputter source | Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag +1 more | 2005-03-01 |
| 6682637 | Magnetron sputter source | Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag +1 more | 2004-01-27 |
| 5234560 | Method and device for sputtering of films | Jindrich Musil | 1993-08-10 |