Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11776825 | Chamber for degassing substrates | Rogier Lodder, Martin Schäfer | 2023-10-03 |
| 11742187 | RF capacitive coupled etch reactor | Johannes Weichart | 2023-08-29 |
| 11469085 | Vacuum plasma workpiece treatment apparatus | Johannes Weichart | 2022-10-11 |
| 11217434 | RF capacitive coupled dual frequency etch reactor | Johannes Weichart | 2022-01-04 |
| 11211234 | Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS) | Stanislav Kadlec | 2021-12-28 |
| 11145495 | Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrate | Frantisek Balon | 2021-10-12 |
| 10692707 | RF substrate bias with high power impulse magnetron sputtering (HIPIMS) | Stanislav Kadlec | 2020-06-23 |
| 10580671 | Chamber for degassing substrates | — | 2020-03-03 |
| 10403522 | Chamber for degassing substrates | — | 2019-09-03 |
| 10388559 | Apparatus for depositing a layer on a substrate in a processing gas | Sven Uwe Rieschl, Mohamed Elghazzali | 2019-08-20 |
| 9934992 | Chamber for degassing substrates | — | 2018-04-03 |
| 9611537 | Target shaping | Stanislav Kadlec | 2017-04-04 |
| 9587306 | Method for producing a directional layer by cathode sputtering, and device for implementing the method | Hartmut Rohrmann, Hanspeter Friedli, Stanislav Kadlec, Martin Dubs | 2017-03-07 |
| 9490166 | Apparatus and method for depositing a layer onto a substrate | Sven Uwe Rieschl, Mohamed Elghazzali | 2016-11-08 |
| 9355824 | Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS) | Stanislav Kadlec | 2016-05-31 |
| 8778144 | Method for manufacturing magnetron coated substrates and magnetron sputter source | — | 2014-07-15 |
| 8613828 | Procedure and device for the production of a plasma | Dominik Wimo Amman, Siegfried Krassnitzer | 2013-12-24 |
| 8475634 | Application of HIPIMS to through silicon via metallization in three-dimensional wafer packaging | Stanislav Kadlec | 2013-07-02 |
| 8435389 | RF substrate bias with high power impulse magnetron sputtering (HIPIMS) | Stanislav Kadlec | 2013-05-07 |
| 8268142 | RF sputtering arrangement | Heinz Felzer | 2012-09-18 |
| 7736462 | Installation for processing a substrate | — | 2010-06-15 |
| 7476301 | Procedure and device for the production of a plasma | Dominik Wimo Amman, Siegfried Krassnitzer | 2009-01-13 |