Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D793976 | Substrate retaining ring | Makoto Fukushima, Hozumi Yasuda, Osamu Nabeya, Shingo Togashi, Satoru Yamaki | 2017-08-08 |
| 9676076 | Polishing method and polishing apparatus | Hozumi Yasuda, Shingo Togashi | 2017-06-13 |
| 9662764 | Substrate holder, polishing apparatus, and polishing method | Makoto Fukushima, Hozumi Yasuda, Osamu Nabeya, Shingo Togashi, Satoru Yamaki | 2017-05-30 |
| 9573241 | Polishing apparatus and polishing method | Makoto Fukushima, Hozumi Yasuda | 2017-02-21 |
| 9573244 | Elastic membrane, substrate holding apparatus, and polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Osamu Nabeya, Shingo Togashi, Satoru Yamaki +1 more | 2017-02-21 |
| D770990 | Elastic membrane for semiconductor wafer polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Osamu Nabeya, Shingo Togashi, Satoru Yamaki | 2016-11-08 |
| D769200 | Elastic membrane for semiconductor wafer polishing apparatus | Makoto Fukushima, Hozumi Yasuda, Osamu Nabeya, Shingo Togashi, Satoru Yamaki | 2016-10-18 |
| D766849 | Substrate retaining ring | Makoto Fukushima, Hozumi Yasuda, Osamu Nabeya, Shingo Togashi, Satoru Yamaki | 2016-09-20 |
| 9403255 | Polishing apparatus and polishing method | Makoto Fukushima, Hozumi Yasuda, Osamu Nabeya, Shingo Togashi, Satoru Yamaki | 2016-08-02 |
| D729753 | Elastic membrane for semiconductor wafer polishing | Makoto Fukushima, Hozumi Yasuda, Osamu Nabeya, Katsuhide Watanabe | 2015-05-19 |
| 8870625 | Method and apparatus for dressing polishing pad, profile measuring method, substrate polishing apparatus, and substrate polishing method | Tetsuji Togawa, Satoru Yamaki | 2014-10-28 |
| 8859070 | Elastic membrane | Hozumi Yasuda, Katsuhide Watanabe, Osamu Nabeya, Makoto Fukushima, Satoru Yamaki +1 more | 2014-10-14 |
| D711330 | Elastic membrane for semiconductor wafer polishing | Makoto Fukushima, Hozumi Yasuda, Osamu Nabeya, Katsuhide Watanabe | 2014-08-19 |
| D634719 | Elastic membrane for semiconductor wafer polishing apparatus | Hozumi Yasuda, Makoto Fukushima, Osamu Nabeya, Koji Saito, Satoru Yamaki +3 more | 2011-03-22 |
| 7901550 | Plating apparatus | Natsuki Makino, Kunihito Ide, Junji Kunisawa, Katsuyuki Musaka | 2011-03-08 |
| D633452 | Elastic membrane for semiconductor wafer polishing apparatus | Hozumi Yasuda, Osamu Nabeya, Makoto Fukushima, Shingo Togashi, Satoru Yamaki +1 more | 2011-03-01 |
| 7897007 | Substrate holding apparatus and substrate polishing apparatus | Yoshihiro Gunji, Hozumi Yasuda, Hiroshi Yoshida | 2011-03-01 |
| 7850509 | Substrate holding apparatus | Tetsuji Togawa, Ikutaro Noji, Hozumi Yasuda, Shunichiro Kojima, Kunihiko Sakurai +4 more | 2010-12-14 |
| 7491117 | Substrate holding apparatus | Tetsuji Togawa, Ikutaro Noji, Hozumi Yasuda, Shunichiro Kojima, Kunihiko Sakurai +4 more | 2009-02-17 |
| 7156725 | Substrate polishing machine | Tetsuji Togawa, Ikutaro Noji, Hozumi Yasuda, Shunichiro Kojima, Kunihiko Sakurai +4 more | 2007-01-02 |
| 7083507 | Substrate holding apparatus | Tetsuji Togawa, Ikutaro Noji, Hozumi Yasuda, Shunichiro Kojima, Kunihiko Sakurai +4 more | 2006-08-01 |
| 6890402 | Substrate holding apparatus and substrate polishing apparatus | Yoshihiro Gunji, Hozumi Yasuda, Hiroshi Yoshida | 2005-05-10 |
| 6852019 | Substrate holding apparatus | Tetsuji Togawa, Ikutaro Noji, Hozumi Yasuda, Shunichiro Kojima, Kunihiko Sakurai +4 more | 2005-02-08 |
| 5651724 | Method and apparatus for polishing workpiece | Norio Kimura, Takayoshi Kawamoto, You Ishii, Katsuyuki Aoki, Kunio Tateishi +1 more | 1997-07-29 |