Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6103443 | Photoresist composition containing a novel polymer | Stanley F. Wanat, Kathryn Jensen, Douglas McKenzie | 2000-08-15 |
| 6096477 | Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom | M. Dalil Rahman, Michelle Cook | 2000-08-01 |
| 6090533 | Isolation of novolak resin without high temperature distillation and photoresist composition therefrom | M. Dalil Rahman | 2000-07-18 |
| 6045966 | Fractionated novolak resin and photoresist composition therefrom | M. Dalil Rahman, Michelle Cook | 2000-04-04 |
| 5994430 | Antireflective coating compositions for photoresist compositions and use thereof | Shuji Ding, Dinesh N. Khanna, Jianhui Shan, Dana L. Durham, Ralph R. Dammel +1 more | 1999-11-30 |
| 5981145 | Light absorbing polymers | Shuji Ding, Dinesh N. Khanna, Jianhui Shan, Ralph R. Dammel, Dana L. Durham +2 more | 1999-11-09 |
| 5977288 | Fractionated novolak resin and photoresist composition therefrom | M. Dalil Rahman | 1999-11-02 |
| 5910559 | Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom | M. Dalil Rahman, Michelle Cook | 1999-06-08 |
| 5876897 | Positive photoresists containing novel photoactive compounds | Dana L. Durham, Joseph E. Oberlander, Dinesh N. Khanna | 1999-03-02 |
| 5863700 | Isolation of novolak resin without high temperature distillation and photoresist composition therefrom | M. Dalil Rahman | 1999-01-26 |
| 5853954 | Fractionated novolak resin and photoresist composition therefrom | M. Dalil Rahman | 1998-12-29 |
| 5763135 | Light sensitive composition containing an arylhydrazo dye | Shuji Ding, Dinesh N. Khanna, Anthony J. Corso | 1998-06-09 |
| 5733714 | Antireflective coating for photoresist compositions | Iain McCulloch, Ralph R. Dammel, Anthony J. Corso, Shuji Ding, Dana L. Durham +2 more | 1998-03-31 |
| 5719004 | Positive photoresist composition containing a 2,4-dinitro-1-naphthol | Ralph R. Dammel, Elaine G. Kokinda, Sunit S. Dixit | 1998-02-17 |
| 5652317 | Antireflective coatings for photoresist compositions | Iain McCulloch, Ralph R. Dammel, Dana L. Durham | 1997-07-29 |
| 5652297 | Aqueous antireflective coatings for photoresist compositions | Iain McCulloch, Ralph R. Dammel, Dana L. Durham, Ming Kang, Dinesh N. Khanna +1 more | 1997-07-29 |
| 5612164 | Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone | Anthony Canize, Stanley A. Ficner, Walter Spiess | 1997-03-18 |
| 5476750 | Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists | M. Dalil Rahman, Daniel P. Aubin, Ralph R. Dammel, Dana L. Durham | 1995-12-19 |
| 5371169 | Novolak resin mixtures | Anthony Canize, Dinesh N. Khanna, M. Dalil Rahman | 1994-12-06 |