Issued Patents All Time
Showing 26–50 of 140 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8663897 | Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same | Takashi MASUBUCHI, Kazunori Mori, Yuji Hagiwara, Satoru Narizuka | 2014-03-04 |
| 8660378 | Image evaluating device for calculating an importance degree of an object and an image, and an image evaluating method, program, and integrated circuit for performing the same | Hiroshi Yabu | 2014-02-25 |
| 8592540 | Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same | Kazunori Mori, Yuji Hagiwara, Yoshimi Isono, Satoru Narizuka | 2013-11-26 |
| 8435717 | Compound for photoacid generator, resist composition using the same, and pattern-forming method | Yuji Hagiwara, Jonathan Joachim Jodry, Satoru Narizuka | 2013-05-07 |
| 8283106 | Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent | Yoshimi Isono, Satoru Narizuka | 2012-10-09 |
| 8211612 | Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern | Mitsutaka Otani, Haruhiko Komoriya, Takeo Komata, Shinya Akiba | 2012-07-03 |
| 8115036 | Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern | Haruhiko Komoriya, Shinichi Sumida, Michitaka Ootani, Takeo Komata | 2012-02-14 |
| 8014139 | Compact and light computer casing structure | Hiroaki Agata | 2011-09-06 |
| 7947422 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | Shinichi Sumida, Haruhiko Komoriya | 2011-05-24 |
| 7932348 | Fluorine-containing polymerizable monomer and polymer compound using same | Hiroshi Saegusa, Satoru Narizuka | 2011-04-26 |
| 7919224 | Coating materials consisting of low- or medium-molecular organic compounds | Satoru Miyazawa, Satoru Kobayashi | 2011-04-05 |
| 7851121 | Photosensitive polyimide composition and polyimide precursor composition | Kazuhiro Yamanaka, Michael Romeo, Clifford Henderson | 2010-12-14 |
| 7825280 | Fluorine-containing polymerizable monomer and polymer compound using same | Hiroshi Saegusa, Satoru Narizuka | 2010-11-02 |
| 7781602 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | Haruhiko Komoriya, Shinichi Sumida, Katsunori Kawamura, Satoru Kobayashi, Satoru Miyazawa | 2010-08-24 |
| 7759440 | Fluorine-containing polymerisable monomer and polymer prepared by using same | Satoru Miyazawa, Kenji Tokuhisa, Shoji Arai | 2010-07-20 |
| 7736835 | Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern | Haruhiko Komoriya, Shinichi Sumida, Michitaka Ootani, Takeo Komata | 2010-06-15 |
| 7728103 | Fluorine-containing polymerizable monomer and polymer compound using same | Hiroshi Saegusa, Satoru Narizuka | 2010-06-01 |
| 7703303 | Magnetic disk glass substrate manufacturing method | Hideki Isono, Shinji Eda, Naohiro Kamiya, Nobuyuki Eto | 2010-04-27 |
| 7666967 | Ester compound, polymer, resist composition, and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +2 more | 2010-02-23 |
| 7629434 | Fluorine-containing polymerizable monomer and polymer compound using same | Hiroshi Saegusa, Satoru Narizuka | 2009-12-08 |
| 7589142 | Thermoplastic resin composition and moldings thereof | Toshio Takemoto, Masakazu Fujii, Yasuharu Fukui, Yoshihiro Urata | 2009-09-15 |
| 7569323 | Resist protective coating material and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masayuki Endo, Masaru Sasago +3 more | 2009-08-04 |
| 7550553 | Fluorinated diamine and polymer made from the same | Kazuhiro Yamanaka | 2009-06-23 |
| 7517635 | Polyester compound and resist material using the same | Satoru Miyazawa, Satoru Kobayashi | 2009-04-14 |
| 7488567 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +2 more | 2009-02-10 |