YF

Yasushi Fujioka

Canon: 49 patents #754 of 19,416Top 4%
Sharp Kabushiki Kaisha: 7 patents #2,322 of 10,731Top 25%
Mitsubishi Electric: 2 patents #11,187 of 25,717Top 45%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
📍 Nagahama, JP: #2 of 132 inventorsTop 2%
Overall (All Time): #40,511 of 4,157,543Top 1%
59
Patents All Time

Issued Patents All Time

Showing 26–50 of 59 patents

Patent #TitleCo-InventorsDate
5720826 Photovoltaic element and fabrication process thereof Ryo Hayashi, Shotaro Okabe, Masahiro Kanai, Jinsho Matsuyama, Akira Sakai +3 more 1998-02-24
5714010 Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same Jinsho Matsuyama, Toshimitsu Kariya, Tetsuya Takei, Katsumi Nakagawa, Masahiro Kanai +1 more 1998-02-03
5589007 Photovoltaic elements and process and apparatus for their formation Shotaro Okabe, Masahiro Kanai, Hideo Tamura, Atsushi Yasuno, Akira Sakai +1 more 1996-12-31
5575855 Apparatus for forming a deposited film Masahiro Kanai, Takehito Yoshino, Tadashi Hori 1996-11-19
5573601 Pin amorphous silicon photovoltaic element with counter-doped intermediate layer Keishi Saitoh, Tatsuyuki Aoike, Masafumi Sano, Mitsuyuki Niwa 1996-11-12
5527391 Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method Hiroshi Echizen, Katsumi Nakagawa, Masahiro Kanai, Toshimitsu Kariya, Jinsho Matsuyama +1 more 1996-06-18
5520740 Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable for practicing the same Masahiro Kanai, Jinsho Matsuyama, Katsumi Nakagawa, Toshimitsu Kariya, Tetsuya Takei +1 more 1996-05-28
5510151 Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space Jinsho Matsuyama, Toshimitsu Kariya, Tetsuya Takei, Katsumi Nakagawa, Masahiro Kanai +1 more 1996-04-23
5468521 Method for forming a photoelectric deposited film Masahiro Kanai, Takehito Yoshino, Tadashi Hori 1995-11-21
5382531 Method for continuously manufacturing a semiconductor device Takashi Kurokawa, Masahiro Kanai, Masafumi Sano, Takehito Yoshino, Yuzo Kohda 1995-01-17
5291484 Relay and exchange system for time division multiplex data Yoshihiro Tomita, Tatsuo Fujiwara, Hirotoshi Shimizu, Masashi Matsumoto 1994-03-01
5284525 Solar cell Keishi Saito, Tatsuyuki Aoike, Mitsuyuki Niwa, Toshimitsu Kariya, Yuzo Kohda 1994-02-08
5266116 Glow discharge apparatus for continuously manufacturing semiconductor device comprising gas gates with slotted rollers Takashi Kurokawa, Masahiro Kanai, Masafumi Sano, Takehito Yoshino, Yuzo Kohda 1993-11-30
5244509 Substrate having an uneven surface for solar cell and a solar cell provided with said substrate Kozo Arao, Mitsuyuki Niwa, Eiji Takeuchi 1993-09-14
5130170 Microwave PCVD method for continuously forming a large area functional deposited film using a curved moving substrate web with microwave energy with a directivity in one direction perpendicular to the direction of microwave propagation Masahiro Kanai, Jinsho Matsuyama, Katsumi Nakagawa, Toshimitsu Kariya, Tetsuya Takei +1 more 1992-07-14
5114770 Method for continuously forming functional deposited films with a large area by a microwave plasma CVD method Hiroshi Echizen, Katsumi Nakagawa, Masahiro Kanai, Toshimitsu Kariya, Jinsho Matsuyama +1 more 1992-05-19
5093704 Semiconductor device having a semiconductor region in which a band gap being continuously graded Keishi Saito 1992-03-03
5028488 Functional ZnSe.sub.1-x Te.sub.x :H deposited film Katsumi Nakagawa, Shunichi Ishihara, Masahiro Kanai, Tsutomu Murakami, Kozo Arao 1991-07-02
5008726 PIN junction photovoltaic element containing Zn, Se, Te, H in an amount of 1 to 4 atomic % Katsumi Nakagawa, Shunichi Ishihara, Masahiro Kanai, Tsutomu Murakami, Kozo Arao +1 more 1991-04-16
4959106 Photovoltaic element with a semiconductor layer comprising non-single crystal material containing at least ZN, SE and H in an amount of 1 to 4 atomic % Katsumi Nakagawa, Masahiro Kanai, Shunichi Ishihara, Kozo Arao, Akira Sakai +1 more 1990-09-25
4940642 Electrophotographic light receiving member having polycrystalline silicon charge injection inhibition layer prepared by chemical reaction of excited precursors and A-SI:C:H surface layer Shigeru Shirai, Keishi Saito, Takayoshi Arai, Minoru Kato 1990-07-10
4926229 Pin junction photovoltaic element with P or N-type semiconductor layer comprising non-single crystal material containing Zn, Se, H in an amount of 1 to 4 atomic % and a dopant and I-type semiconductor layer comprising non-single crystal Si(H,F) material Katsumi Nakagawa, Shunichi Ishihara, Masahiro Kanai, Kozo Arao, Akira Sakai 1990-05-15
4888062 Pin junction photovoltaic element having I-type semiconductor layer comprising non-single crystal material containing at least Zn, Se and H in an amount of 1 to 4 atomic % Katsumi Nakagawa, Masahiro Kanai, Shunichi Ishihara, Kozo Arao, Akira Sakai +1 more 1989-12-19
4887134 Semiconductor device having a semiconductor region in which either the conduction or valence band remains flat while bandgap is continuously graded Keishi Saito 1989-12-12
4851302 Functional ZnSe:H deposited films Katsumi Nakagawa, Shunichi Ishihara, Kozo Arao, Akira Sakai, Masahiro Kanai 1989-07-25