Issued Patents All Time
Showing 1–25 of 90 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5741615 | Light receiving member with non-single-crystal silicon layer containing Cr, Fe, Na, Ni and Mg | Kozo Arao, Tatsuyuki Aoike | 1998-04-21 |
| 5637358 | Microwave plasma chemical vapor deposition process using a microwave window and movable, dielectric sheet | Hirokazu Otoshi, Ryuji Okamura, Koichi Matsuda | 1997-06-10 |
| 5635408 | Method of producing a semiconductor device | Masafumi Sano | 1997-06-03 |
| 5573601 | Pin amorphous silicon photovoltaic element with counter-doped intermediate layer | Tatsuyuki Aoike, Yasushi Fujioka, Masafumi Sano, Mitsuyuki Niwa | 1996-11-12 |
| 5527396 | Deposited film forming apparatus | Tatsuyuki Aoike, Masafumi Sano, Mitsuyuki Niwa, Jinsho Matsuyama, Toshimitsu Kariya +3 more | 1996-06-18 |
| 5482557 | Device for forming deposited film | Masahiro Kanai, Masaaki Hirooka, Jun-Ichi Hanna, Isamu Shimizu | 1996-01-09 |
| 5417770 | Photovoltaic device and a forming method thereof | Tatsuyuki Aoike, Masafumi Sano, Mitsuyuki Niwa, Jinsho Matsuyama, Toshimitsu Kariya +3 more | 1995-05-23 |
| 5236798 | Electrophotographic light receiving member having a photoconductive layer formed of non-single crystal silicon material and a surface layer containing polysilane compound | Tatsuyuki Aoike, Koichi Matsuda, Mitsuyuki Niwa, Masafumi Sano, Hisami Tanaka | 1993-08-17 |
| 5190838 | Electrophotographic image-forming member with photoconductive layer comprising non-single-crystal silicon carbide | Masafumi Sano, Koichi Matsuda | 1993-03-02 |
| 5061511 | Method for forming functional deposited films by means of microwave plasma chemical vapor deposition method | Junichiro Hashizume, Shigehira Iida, Tetsuya Takei, Takayoshi Arai | 1991-10-29 |
| 5016565 | Microwave plasma chemical vapor deposition apparatus for forming functional deposited film with means for stabilizing plasma discharge | Ryuji Okamura, Hirokazu Otoshi, Koichi Matsuda | 1991-05-21 |
| 4957772 | Method for forming functional deposited films by means of microwave plasma chemical vapor deposition method | Junichiro Hashizume, Shigehira Iida, Tetsuya Takei, Takayoshi Arai | 1990-09-18 |
| 4953498 | Microwave plasma CVD apparatus having substrate shielding member | Junichiro Hashizume, Tetsuya Takei, Shigehira Iida, Takayoshi Arai | 1990-09-04 |
| 4930442 | Microwave plasma CVD apparatus having an improved microwave transmissive window | Shigehira Iida, Takayoshi Arai, Junichiro Hashizume, Tetsuya Takei | 1990-06-05 |
| 4897284 | Process for forming a deposited film on each of a plurality of substrates by way of microwave plasma chemical vapor deposition method | Takayoshi Arai, Shigehira Iida, Junichiro Hashizume, Tetsuya Takei | 1990-01-30 |
| 4897281 | Process for the formation of a functional deposited film by way of microwave plasma CVD method | Takayoshi Arai, Shigehira Iida, Junichiro Hashizume, Tetsuya Takei | 1990-01-30 |
| 4865883 | Method for forming a deposited film containing IN or SN | Masaaki Hirooka, Jun-Ichi Hanna, Isamu Shimizu | 1989-09-12 |
| 4844950 | Method for forming a metal film on a substrate | Masaaki Hirooka, Jun-Ichi Hanna, Isamu Shimizu | 1989-07-04 |
| 4834023 | Apparatus for forming deposited film | Masaaki Hirooka, Jun-Ichi Hanna, Isamu Shimizu | 1989-05-30 |
| 4822636 | Method for forming deposited film | Masaaki Hirooka, Junichi Hanna, Isamu Shimizu | 1989-04-18 |
| 4812328 | Method for forming deposited film | Masaaki Hirooka, Junichi Hanna, Isamu Shimizu | 1989-03-14 |
| 4804558 | Process for producing electroluminescent devices | Masaaki Hirooka, Junichi Hanna, Isamu Shimizu | 1989-02-14 |
| 4795688 | Layered photoconductive member comprising amorphous silicon | Teruo Misumi, Kyosuke Ogawa, Junichiro Kanbe, Yoichi Osato, Shigeru Shirai | 1989-01-03 |
| 4792509 | Light receiving member for use in electrophotography | Shigeru Shirai, Takayoshi Arai, Minoru Kato, Yasushi Fujioka | 1988-12-20 |
| 4785763 | Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process | — | 1988-11-22 |