Issued Patents All Time
Showing 26–50 of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7648833 | Container for germ layer formation and method of forming germ layer | Shujiro Sakaki | 2010-01-19 |
| 7542141 | Stage controller and exposure method in which position of the stage is controlled based on position measurements of first and second laser interferometers | — | 2009-06-02 |
| 7411678 | Alignment apparatus, control method thereof, exposure apparatus and method of manufacturing semiconductor device by exposure apparatus controlled by the same control method | — | 2008-08-12 |
| 7315350 | Exposure apparatus, reticle shape measurement apparatus and method | — | 2008-01-01 |
| 7292311 | Scanning exposure technique | — | 2007-11-06 |
| 7027128 | Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory | — | 2006-04-11 |
| 7016049 | Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method | — | 2006-03-21 |
| 6940584 | Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory | — | 2005-09-06 |
| 6870599 | Exposure method and apparatus, and device manufacturing method | — | 2005-03-22 |
| 6704093 | Scanning exposure apparatus, scanning exposure method, and device manufacturing method | — | 2004-03-09 |
| 6657703 | Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory | — | 2003-12-02 |
| 6424405 | Exposure apparatus and device manufacturing method | Kunitaka Ozawa, Noriyasu Hasegawa, Keiji Yoshimura | 2002-07-23 |
| 6204911 | Exposure apparatus and device manufacturing method | Kunitaka Ozawa, Noriyasu Hasegawa, Keiji Yoshimura | 2001-03-20 |
| 6057647 | Light emitting device used for display device | Tomoyuki Shirasaki, Hiroyasu Jobetto | 2000-05-02 |
| 5999589 | Substrate holding device and exposing apparatus using the same | Yuji Chiba, Nobutoshi Mizusawa, Kazunori Iwamoto, Yutaka Tanaka, Shinichi Hara +2 more | 1999-12-07 |
| 5914773 | Exposure apparatus and method using pulsed light and changing means to control both the light intensity and light emission timing | Kunitaka Ozawa, Noriyasu Hasegawa, Keiji Yoshimura | 1999-06-22 |
| 5898477 | Exposure apparatus and method of manufacturing a device using the same | Keiji Yoshimura, Kunitaka Ozawa, Noriyasu Hasegawa | 1999-04-27 |
| 5883932 | Substrate holding device and exposing apparatus using the same | Yuji Chiba, Nobutoshi Mizusawa, Kazunori Iwamoto, Yutaka Tanaka, Shinichi Hara +2 more | 1999-03-16 |
| 5883701 | Scanning projection exposure method and apparatus | Noriyasu Hasegawa, Kunitaka Ozawa, Keiji Yoshimura | 1999-03-16 |
| 5757838 | Output control method for excimer laser | Noriyasu Hasegawa, Kunitaka Ozawa, Keiji Yoshimura | 1998-05-26 |
| 5661388 | Positioning method and positioning system | — | 1997-08-26 |
| 5385830 | Apparatus for measuring free and total sulfurous acid and method of measurement | Yoshifumi Amano, Kazuo Nakamura, Takeshi Sato, Hirofumi Akano, Yoshiya Kawamura | 1995-01-31 |
| 5377251 | Exposure apparatus | Nobutoshi Mizusawa, Ryuichi Ebinuma, Koji Uda, Takao Kariya, Shumichi Uzawa | 1994-12-27 |
| 5365561 | Exposure control in an X-ray exposure apparatus | Ryuichi Ebinuma, Nobutoshi Mizusawa, Masayuki Suzuki, Shinichirou Uno, Tetsuzo Mori | 1994-11-15 |
| 5317142 | Automatic focusing apparatus which removes light reflected by a lower surface of a sample | Hiroaki Noda, Shinichi Dosaka | 1994-05-31 |