MH

Maarten Marinus Johannes Wilhelmus Van Herpen

AB Asml Netherlands B.V.: 61 patents #41 of 3,192Top 2%
Philips: 28 patents #44 of 7,731Top 1%
Koniniklijke Philips N.V.: 16 patents #398 of 7,486Top 6%
PB Philips Lighting Holding B.V.: 9 patents #38 of 962Top 4%
SB Signify Holding B.V.: 5 patents #189 of 1,458Top 15%
KN Konklijke Philips Electronics N.V.: 1 patents #1 of 18Top 6%
📍 Heesch, NL: #1 of 37 inventorsTop 3%
Overall (All Time): #10,381 of 4,157,543Top 1%
118
Patents All Time

Issued Patents All Time

Showing 101–118 of 118 patents

Patent #TitleCo-InventorsDate
7473908 Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Wouter Anton Soer 2009-01-06
7468521 Lithographic apparatus and device manufacturing method Derk Jan Wilfred Klunder, Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Frank Jeroen Pieter Schuurmans, Dominik Marcel Vaudrevange 2008-12-23
7465943 Controlling the flow through the collector during cleaning Vadim Yevgenyevich Banine, Sonia Margart Skelly, Derk Jan Wilfred Klunder 2008-12-16
7462850 Radical cleaning arrangement for a lithographic apparatus Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Derk Jan Wilfred Klunder 2008-12-09
7463413 Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder 2008-12-09
7453645 Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby Derk Jan Wilfred Klunder 2008-11-18
7414700 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Carolus Ida Maria Antonius Spee, Derk Jan Wilfred Klunder 2008-08-19
7397538 Radiation system and lithographic apparatus Wilhelmus Josephus Box, Derk Jan Wilfred Klunder, Niels Machiel Driessen, Hendrikus Gijsbertus Schimmel 2008-07-08
7372049 Lithographic apparatus including a cleaning device and method for cleaning an optical element Derk Jan Wilfred Klunder 2008-05-13
7355672 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Carolus Ida Maria Antonius Spee, Derk Jan Wilfred Klunder 2008-04-08
7336416 Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder 2008-02-26
7332731 Radiation system and lithographic apparatus Derk Jan Wilfred Klunder 2008-02-19
7262423 Radiation system and lithographic apparatus Johannes Hubertus Josephina Moors, Derk Jan Wilfred Klunder 2007-08-28
7233010 Radiation system and lithographic apparatus Vadim Yevgenyevich Banine, Arnoud Cornelis Wassink, Derk Jan Wilfred Klunder 2007-06-19
7196343 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby Levinus Pieter Bakker, Derk Jan Wilfred Klunder 2007-03-27
7145631 Lithographic apparatus, illumination system and method for mitigating debris particles 2006-12-05
7145132 Lithographic apparatus, illumination system and debris trapping system Levinus Pieter Bakker, Derk Jan Wilfred Klunder 2006-12-05
7106832 Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source Derk Jan Wilfred Klunder, Levinus Pieter Bakker, Vadim Yevgenyevich Banine 2006-09-12