Issued Patents All Time
Showing 51–70 of 70 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7344432 | Conductive pad with ion exchange membrane for electrochemical mechanical polishing | Liang-Yun Chen, Yuchun Wang, Alain Duboust, Daniel Carl, Ralph Wadensweiler +9 more | 2008-03-18 |
| 7323416 | Method and composition for polishing a substrate | Feng Q. Liu, Tianbao Du, Alain Duboust, Yongqi Hu, Stan Tsai +3 more | 2008-01-29 |
| 7311592 | Conductive polishing article for electrochemical mechanical polishing | Liang-Yuh Chen, Yuchun Wang, Alain Duboust, Daniel Carl, Ralph Wadensweiler +4 more | 2007-12-25 |
| 7276743 | Retaining ring with conductive portion | Antoine P. Manens, Suresh Shrauti, Alain Duboust, Liang-Yuh Chen | 2007-10-02 |
| 7232514 | Method and composition for polishing a substrate | Feng Q. Liu, Stan Tsai, Yongqi Hu, Siew Neo, Alain Duboust +1 more | 2007-06-19 |
| 7229535 | Hydrogen bubble reduction on the cathode using double-cell designs | Feng Q. Liu, Alain Duboust, Siew Neo, Liang-Yuh Chen, Yongqi Hu | 2007-06-12 |
| 7210988 | Method and apparatus for reduced wear polishing pad conditioning | Stan Tsai, Yongqi Hu, Feng Q. Liu, Liang-Yuh Chen, Daxin Mao +4 more | 2007-05-01 |
| 7207878 | Conductive polishing article for electrochemical mechanical polishing | Yongqi Hu, Alain Duboust, Feng Q. Liu, Antoine P. Manens, Siew Neo +5 more | 2007-04-24 |
| 7160432 | Method and composition for polishing a substrate | Feng Q. Liu, Liang-Yuh Chen, Stan Tsai, Alain Duboust, Siew Neo +2 more | 2007-01-09 |
| 7137879 | Conductive polishing article for electrochemical mechanical polishing | Liang-Yuh Chen, Yuchun Wang, Alain Duboust, Daniel Carl, Ralph Wadensweiler +4 more | 2006-11-21 |
| 7128825 | Method and composition for polishing a substrate | Feng Q. Liu, Stan Tsai, Yongqi Hu, Siew Neo, Alain Duboust +1 more | 2006-10-31 |
| 7107703 | Shoe sole | — | 2006-09-19 |
| 7077721 | Pad assembly for electrochemical mechanical processing | Yongqi Hu, Stan Tsai, Feng Q. Liu, Shou-Sung Chang, Liang-Yuh Chen | 2006-07-18 |
| 7066800 | Conductive polishing article for electrochemical mechanical polishing | Liang-Yuh Chen, Yuchun Wang, Alain Duboust, Daniel Carl, Ralph Wadensweiler +4 more | 2006-06-27 |
| 6991528 | Conductive polishing article for electrochemical mechanical polishing | Yongqi Hu, Alain Duboust, Feng Q. Liu, Antoine P. Manens, Siew Neo +5 more | 2006-01-31 |
| 6988942 | Conductive polishing article for electrochemical mechanical polishing | Liang-Yuh Chen, Yuchun Wang, Alain Duboust, Daniel Carl, Ralph Wadensweiler +4 more | 2006-01-24 |
| 6979248 | Conductive polishing article for electrochemical mechanical polishing | Yongqi Hu, Alain Duboust, Feng Q. Liu, Rashid Mavliev, Liang-Yuh Chen +2 more | 2005-12-27 |
| 6899804 | Electrolyte composition and treatment for electrolytic chemical mechanical polishing | Alain Duboust, Lizhong Sun, Feng Q. Liu, Yuchun Wang, Siew Neo +1 more | 2005-05-31 |
| 6837983 | Endpoint detection for electro chemical mechanical polishing and electropolishing processes | Alain Duboust, Siew Neo, Liang-Yuh Chen | 2005-01-04 |
| 6776693 | Method and apparatus for face-up substrate polishing | Alain Duboust, Shou-Sung Chang, Liang-Yuh Chen, Siew Neo, Lizhong Sun +1 more | 2004-08-17 |