Issued Patents All Time
Showing 51–56 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6425812 | Polishing head for chemical mechanical polishing using linear planarization technology | Anil K. Pant, Douglas W. Young, Glenn W. Travis, Konstantin Volodarsky | 2002-07-30 |
| 6328637 | Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization | Michael Labunsky, Tac Huynh, Anthony Meyer, Glenn W. Travis | 2001-12-11 |
| 6325706 | Use of zeta potential during chemical mechanical polishing for end point detection | Wilbur C. Krusell, Anil K. Pant | 2001-12-04 |
| 6186865 | Apparatus and method for performing end point detection on a linear planarization tool | Brian Thornton, Robert G. Boehm, Jr., Anil K. Pant, Wilbur C. Krusell | 2001-02-13 |
| 6132289 | Apparatus and method for film thickness measurement integrated into a wafer load/unload unit | Michael Labunsky, Anil K. Pant | 2000-10-17 |
| 6086460 | Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization | Michael Labunsky, Tac Huynh, Anthony Meyer, Glenn W. Travis | 2000-07-11 |