| 6190518 |
Device for reducing plasma etch damage and method for manufacturing same |
Tony Phan, Tom J. Goodwin |
2001-02-20 |
| 5963783 |
In-line detection and assessment of net charge in PECVD silicon dioxide (oxide) layers |
Fred N. Hause, Robert Dawson |
1999-10-05 |
| 5907764 |
In-line detection and assessment of net charge in PECVD silicon dioxide (oxide) layers |
Fred N. Hause, Robert Dawson |
1999-05-25 |
| 5891743 |
Method of forming buried oxygen layer using MeV ion implantation |
— |
1999-04-06 |
| 5841016 |
Ultra-low level standard for concentration measurements |
Tim Z. Hossain |
1998-11-24 |
| 5804981 |
Method of detecting heavy metal impurities introduced into a silicon wafer during ion implantation |
Norman L. Armour, Julia Sherry |
1998-09-08 |
| 5778039 |
Method and apparatus for the detection of light elements on the surface of a semiconductor substrate using x-ray fluorescence (XRF) |
Tim Z. Hossain |
1998-07-07 |
| 5657363 |
Method and apparatus for determining the thickness and elemental composition of a thin film using radioisotopic X-ray fluorescence (RXRF) |
Tim Z. Hossain |
1997-08-12 |
| 5581194 |
Method and apparatus for passive optical characterization of semiconductor substrates subjected to high energy (MEV) ion implantation using high-injection surface photovoltage |
— |
1996-12-03 |
| 5557409 |
Characterization of an external silicon interface using optical second harmonic generation |
Michael W. Downer, Jerry Dadap |
1996-09-17 |
| 5471293 |
Method and device for determining defects within a crystallographic substrate |
Mohammed Anjum, Valerie A. Wenner, Norman L. Armour, Maung H. Kyaw |
1995-11-28 |