| 7118967 |
Protection of charge trapping dielectric flash memory devices from UV-induced charging in BEOL processing |
Minh Van Ngo, Ning Cheng, Jeff P. Erhardt, Clarence B. Ferguson, Cyrus E. Tabery +2 more |
2006-10-10 |
| 6809402 |
Reflowable-doped HDP film |
Dawn Hopper, Minh Van Ngo, Atul Gupta, Tyagamohan Gottipati |
2004-10-26 |
| 6492258 |
METHOD FOR REDUCING STRESS-INDUCED VOIDS FOR 0.25-&mgr;M AND SMALLER SEMICONDUCTOR CHIP TECHNOLOGY BY ANNEALING INTERCONNECT LINES AND USING LOW BIAS VOLTAGE AND LOW INTERLAYER DIELECTRIC DEPOSITION RATE AND SEMICONDUCTOR CHIP MADE THEREBY |
Minh Van Ngo, Paul R. Besser, Matthew S. Buynoski, Nick Maccrae, Richard J. Huang +1 more |
2002-12-10 |
| 6329718 |
Method for reducing stress-induced voids for 0.25m.mu. and smaller semiconductor chip technology by annealing interconnect lines and using low bias voltage and low interlayer dielectric deposition rate and semiconductor chip made thereby |
Minh Van Ngo, Paul R. Besser, Matthew S. Buynoski, Nick Maccrae, Richard J. Huang +1 more |
2001-12-11 |
| 6060404 |
In-situ deposition of stop layer and dielectric layer during formation of local interconnects |
Minh Van Ngo, Darin A. Chan, Sey-Ping Sun, Terri Jo Kitson |
2000-05-09 |