Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6667512 | Asymmetric retrograde halo metal-oxide-semiconductor field-effect transistor (MOSFET) | Concetta Riccobene | 2003-12-23 |
| 6548335 | Selective epitaxy to reduce gate/gate dielectric interface roughness | Concetta Riccobene, Scott Luning | 2003-04-15 |
| 6531347 | Method of making recessed source drains to reduce fringing capacitance | Judy Xilin An, Richard P. Rouse | 2003-03-11 |
| 6518072 | Deposited screen oxide for reducing gate edge lifting | Daniel Sobek, Timothy Thurgate, Sameer Haddad | 2003-02-11 |
| 6487121 | Method of programming a non-volatile memory cell using a vertical electric field | Timothy Thurgate | 2002-11-26 |
| 6426279 | Epitaxial delta doping for retrograde channel profile | Emi Ishida | 2002-07-30 |
| 6395606 | MOSFET with metal in gate for reduced gate resistance | Ognjen Milic-Strkalj, Emi Ishida | 2002-05-28 |
| 6396103 | Optimized single side pocket implant location for a field effect transistor | Concetta Riccobene | 2002-05-28 |
| 6391767 | Dual silicide process to reduce gate resistance | Concetta Riccobene, Wei Long | 2002-05-21 |
| 6337246 | Method for inhibiting tunnel oxide growth at the edges of a floating gate during semiconductor device processing | Daniel Sobek, Timothy Thurgate, Tuan Pham, Mark T. Ramsbey, Sameer Haddad | 2002-01-08 |
| 6329687 | Two bit flash cell with two floating gate regions | Daniel Sobek, Timothy Thurgate, Masaaki Higashitani | 2001-12-11 |
| 6329273 | Solid-source doping for source/drain to eliminate implant damage | Timothy Thurgate | 2001-12-11 |
| 6268624 | Method for inhibiting tunnel oxide growth at the edges of a floating gate during semiconductor device processing | Daniel Sobek, Timothy Thurgate, Tuan Pham, Mark T. Ramsbey, Sameer Haddad | 2001-07-31 |
| 6255165 | Nitride plug to reduce gate edge lifting | Timothy Thurgate, Daniel Sobek | 2001-07-03 |
| 6242329 | Method for manufacturing asymmetric channel transistor | Concetta Riccobene, Richard P. Rouse, Donald L. Wollesen | 2001-06-05 |
| 6238978 | Use of etch to blunt gate corners | — | 2001-05-29 |
| 6229198 | Non-uniform gate doping for reduced overlap capacitance | Effiong Ibok | 2001-05-08 |
| 6225229 | Removable photoresist spacers in CMOS transistor fabrication | — | 2001-05-01 |