| 6667512 |
Asymmetric retrograde halo metal-oxide-semiconductor field-effect transistor (MOSFET) |
Concetta Riccobene |
2003-12-23 |
| 6548335 |
Selective epitaxy to reduce gate/gate dielectric interface roughness |
Concetta Riccobene, Scott Luning |
2003-04-15 |
| 6531347 |
Method of making recessed source drains to reduce fringing capacitance |
Judy Xilin An, Richard P. Rouse |
2003-03-11 |
| 6518072 |
Deposited screen oxide for reducing gate edge lifting |
Daniel Sobek, Timothy Thurgate, Sameer Haddad |
2003-02-11 |
| 6487121 |
Method of programming a non-volatile memory cell using a vertical electric field |
Timothy Thurgate |
2002-11-26 |
| 6426279 |
Epitaxial delta doping for retrograde channel profile |
Emi Ishida |
2002-07-30 |
| 6395606 |
MOSFET with metal in gate for reduced gate resistance |
Ognjen Milic-Strkalj, Emi Ishida |
2002-05-28 |
| 6396103 |
Optimized single side pocket implant location for a field effect transistor |
Concetta Riccobene |
2002-05-28 |
| 6391767 |
Dual silicide process to reduce gate resistance |
Concetta Riccobene, Wei Long |
2002-05-21 |
| 6337246 |
Method for inhibiting tunnel oxide growth at the edges of a floating gate during semiconductor device processing |
Daniel Sobek, Timothy Thurgate, Tuan Pham, Mark T. Ramsbey, Sameer Haddad |
2002-01-08 |
| 6329687 |
Two bit flash cell with two floating gate regions |
Daniel Sobek, Timothy Thurgate, Masaaki Higashitani |
2001-12-11 |
| 6329273 |
Solid-source doping for source/drain to eliminate implant damage |
Timothy Thurgate |
2001-12-11 |
| 6268624 |
Method for inhibiting tunnel oxide growth at the edges of a floating gate during semiconductor device processing |
Daniel Sobek, Timothy Thurgate, Tuan Pham, Mark T. Ramsbey, Sameer Haddad |
2001-07-31 |
| 6255165 |
Nitride plug to reduce gate edge lifting |
Timothy Thurgate, Daniel Sobek |
2001-07-03 |
| 6242329 |
Method for manufacturing asymmetric channel transistor |
Concetta Riccobene, Richard P. Rouse, Donald L. Wollesen |
2001-06-05 |
| 6238978 |
Use of etch to blunt gate corners |
— |
2001-05-29 |
| 6229198 |
Non-uniform gate doping for reduced overlap capacitance |
Effiong Ibok |
2001-05-08 |
| 6225229 |
Removable photoresist spacers in CMOS transistor fabrication |
— |
2001-05-01 |