YH

Yueh-Se Ho

AS Alpha And Omega Semiconductor: 83 patents #6 of 159Top 4%
SI Siliconix Incorporated: 13 patents #12 of 125Top 10%
VI Vishay Intertechnology: 5 patents #4 of 42Top 10%
VI Vishay-Siliconix: 4 patents #26 of 84Top 35%
A( Alpha And Omega Semiconductor (Cayman): 3 patents #40 of 99Top 45%
MC Microelectronics Center Of North Carolina: 1 patents #6 of 13Top 50%
📍 Sunnyvale, CA: #77 of 14,302 inventorsTop 1%
🗺 California: #1,844 of 386,348 inventorsTop 1%
Overall (All Time): #11,998 of 4,157,543Top 1%
110
Patents All Time

Issued Patents All Time

Showing 101–110 of 110 patents

Patent #TitleCo-InventorsDate
5904525 Fabrication of high-density trench DMOS using sidewall spacers Fwu-Iuan Hshieh, Bosco Lan, Jowei Dun 1999-05-18
5767578 Surface mount and flip chip technology with diamond film passivation for total integated circuit isolation Mike F. Chang, King Owyang, Fwu-Iuan Hshieh, Jowei Dun, Hans-Jurgen Fusser +1 more 1998-06-16
5757081 Surface mount and flip chip technology for total integrated circuit isolation Mike F. Chang, King Owyang, Fwu-Iuan Hshieh, Jowei Dun 1998-05-26
5753529 Surface mount and flip chip technology for total integrated circuit isolation Mike F. Chang, King Owyang, Fwu-Iuan Hshieh, Jowei Dun 1998-05-19
5750416 Method of forming a lateral field effect transistor having reduced drain-to-source on-resistance Fwu-Iuan Hshieh, Mike F. Chang, Jan Van Der Linde 1998-05-12
5639676 Trenched DMOS transistor fabrication having thick termination region oxide Fwu-Iuan Hshieh, Mike F. Chang, King Owyang 1997-06-17
5578851 Trenched DMOS transistor having thick field oxide in termination region Fwu-Iuan Hshieh, Mike F. Chang, King Owyang 1996-11-26
5468982 Trenched DMOS transistor with channel block at cell trench corners Fwu-Iuan Hshieh, Sze-Hon Kwan, Mike F. Chang, Jan Van Der Linde, King Owyang 1995-11-21
5316959 Trenched DMOS transistor fabrication using six masks Sze-Hon Kwan, Fwu-Iuan Hshieh, Mike F. Chang, King Owyang 1994-05-31
4738761 Shared current loop, multiple field apparatus and process for plasma processing Stephen M. Bobbio 1988-04-19