Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10919045 | Method and device for fragmenting and/or weakening pourable material by means of high-voltage discharges | Alexander Weh, Jean-Pierre Aeby | 2021-02-16 |
| 10730054 | Method and device for fragmenting and/or weakening pourable material by means of high-voltage discharges | Reinhard Müller-Siebert | 2020-08-04 |
| 9447500 | CVD reactor having a substrate holder resting on a gas cushion comprising a plurality of zones | Francisco Ruda Y Witt | 2016-09-20 |
| 8986453 | Device for coating substrates disposed on a susceptor | Adam Boyd, Victor Saywell, Jan Mulder, Olivier Feron | 2015-03-24 |
| 8439023 | Ignition coil, in particular for an internal combustion engine of a motor vehicle | Konstantin Lindenthal, Holger Raaf, Thomas Breckle | 2013-05-14 |
| 8308867 | Device for the temperature control of the surface temperatures of substrates in a CVD reactor | Walter Franken | 2012-11-13 |
| 8157915 | CVD reactor having a process-chamber ceiling which can be lowered | Martin Dauelsberg, Bernd Schulte | 2012-04-17 |
| 8152924 | CVD reactor comprising a gas inlet member | Martin Dauelsberg, Conor Nicholas Martin | 2012-04-10 |
| 8062426 | CVD reactor with RF-heated process chamber | Frank Wischmeyer | 2011-11-22 |
| 7332038 | Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates | Holger Jurgensen, Gerhard Karl Strauch | 2008-02-19 |
| 7201942 | Coating method | Holger Jurgensen, Gerd Strauch, Dietmar Schmitz | 2007-04-10 |
| 7147718 | Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates | Holger Jurgensen, Gerhard Karl Strauch | 2006-12-12 |
| 7067012 | CVD coating device | Holger Jurgensen, Gerhard Karl Strauch | 2006-06-27 |
| 7056388 | Reaction chamber with at least one HF feedthrough | Walter Franken, Gerd Strauch, Holger Jurgensen | 2006-06-06 |
| 6905548 | Device for the deposition of crystalline layers on crystalline substrates | Holger Jurgensen, Gerhard Karl Strauch | 2005-06-14 |
| 6811614 | CVD reactor with substrate holder which is rotatably driven and mounted by a gas stream | Frank Wischmeyer, Rune Berge | 2004-11-02 |
| 6309465 | CVD reactor | Holger Jurgensen, Marc Deschler, Gerd Strauch, Markus Schumacher | 2001-10-30 |