JK

Johannes Käppeler

AI Aixtron: 13 patents #2 of 62Top 4%
SA Selfrag Ag: 2 patents #4 of 17Top 25%
AS Aixtron Se: 1 patents #40 of 116Top 35%
Robert Bosch Gmbh: 1 patents #10,465 of 19,740Top 55%
Overall (All Time): #272,395 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
10919045 Method and device for fragmenting and/or weakening pourable material by means of high-voltage discharges Alexander Weh, Jean-Pierre Aeby 2021-02-16
10730054 Method and device for fragmenting and/or weakening pourable material by means of high-voltage discharges Reinhard Müller-Siebert 2020-08-04
9447500 CVD reactor having a substrate holder resting on a gas cushion comprising a plurality of zones Francisco Ruda Y Witt 2016-09-20
8986453 Device for coating substrates disposed on a susceptor Adam Boyd, Victor Saywell, Jan Mulder, Olivier Feron 2015-03-24
8439023 Ignition coil, in particular for an internal combustion engine of a motor vehicle Konstantin Lindenthal, Holger Raaf, Thomas Breckle 2013-05-14
8308867 Device for the temperature control of the surface temperatures of substrates in a CVD reactor Walter Franken 2012-11-13
8157915 CVD reactor having a process-chamber ceiling which can be lowered Martin Dauelsberg, Bernd Schulte 2012-04-17
8152924 CVD reactor comprising a gas inlet member Martin Dauelsberg, Conor Nicholas Martin 2012-04-10
8062426 CVD reactor with RF-heated process chamber Frank Wischmeyer 2011-11-22
7332038 Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates Holger Jurgensen, Gerhard Karl Strauch 2008-02-19
7201942 Coating method Holger Jurgensen, Gerd Strauch, Dietmar Schmitz 2007-04-10
7147718 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates Holger Jurgensen, Gerhard Karl Strauch 2006-12-12
7067012 CVD coating device Holger Jurgensen, Gerhard Karl Strauch 2006-06-27
7056388 Reaction chamber with at least one HF feedthrough Walter Franken, Gerd Strauch, Holger Jurgensen 2006-06-06
6905548 Device for the deposition of crystalline layers on crystalline substrates Holger Jurgensen, Gerhard Karl Strauch 2005-06-14
6811614 CVD reactor with substrate holder which is rotatably driven and mounted by a gas stream Frank Wischmeyer, Rune Berge 2004-11-02
6309465 CVD reactor Holger Jurgensen, Marc Deschler, Gerd Strauch, Markus Schumacher 2001-10-30