Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Johannes Käppeler — 17 Patents

AIAixtron: 13 patents #2 of 62Top 4%
SASelfrag Ag: 2 patents #4 of 17Top 25%
ASAixtron Se: 1 patents #40 of 116Top 35%
Robert Bosch Gmbh: 1 patents #10,465 of 19,740Top 55%
Harsewinkel, DE: #5 of 164 inventorsTop 4%
Overall (All Time): #263,971 of 4,157,543Top 7%
17 Patents All Time
Johannes Käppeler has been granted 17 US patents while listed as an inventor at Aixtron. The first was granted in 2001 and the most recent in February 2021. Johannes Käppeler ranks #263,971 of 4,157,543 US inventors in our database (top 6.3%). Patent records list Johannes Käppeler in Harsewinkel, DE.

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
10919045 Method and device for fragmenting and/or weakening pourable material by means of high-voltage discharges Alexander Weh, Jean-Pierre Aeby 2021-02-16
10730054 Method and device for fragmenting and/or weakening pourable material by means of high-voltage discharges Reinhard Müller-Siebert 2020-08-04
9447500 CVD reactor having a substrate holder resting on a gas cushion comprising a plurality of zones Francisco Ruda Y Witt 2016-09-20 $413,000
8986453 Device for coating substrates disposed on a susceptor Adam Boyd, Victor Saywell, Jan Mulder, Olivier Feron 2015-03-24
8439023 Ignition coil, in particular for an internal combustion engine of a motor vehicle Konstantin Lindenthal, Holger Raaf, Thomas Breckle 2013-05-14
8308867 Device for the temperature control of the surface temperatures of substrates in a CVD reactor Walter Franken 2012-11-13
8157915 CVD reactor having a process-chamber ceiling which can be lowered Martin Dauelsberg, Bernd Schulte 2012-04-17
8152924 CVD reactor comprising a gas inlet member Martin Dauelsberg, Conor Nicholas Martin 2012-04-10
8062426 CVD reactor with RF-heated process chamber Frank Wischmeyer 2011-11-22
7332038 Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates Holger Jurgensen, Gerhard Karl Strauch 2008-02-19 $1,492,000
7201942 Coating method Holger Jurgensen, Gerd Strauch, Dietmar Schmitz 2007-04-10 $942,000
7147718 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates Holger Jurgensen, Gerhard Karl Strauch 2006-12-12 $507,000
7067012 CVD coating device Holger Jurgensen, Gerhard Karl Strauch 2006-06-27 $396,000
7056388 Reaction chamber with at least one HF feedthrough Walter Franken, Gerd Strauch, Holger Jurgensen 2006-06-06 $422,000
6905548 Device for the deposition of crystalline layers on crystalline substrates Holger Jurgensen, Gerhard Karl Strauch 2005-06-14 $590,000
6811614 CVD reactor with substrate holder which is rotatably driven and mounted by a gas stream Frank Wischmeyer, Rune Berge 2004-11-02
6309465 CVD reactor Holger Jurgensen, Marc Deschler, Gerd Strauch, Markus Schumacher 2001-10-30