Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Device for the temperature control of the surface temperatures of substrates in a CVD reactor

Device for the temperature control of the surface temperatures of substrates in a CVD reactor

US Patent 8308867 · Granted Nov 13, 2012

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and device for fragmenting and/or weakening pourable material by means of2021
CVD or PVD reactor for coating large-area substrates2020
Method and device for fragmenting and/or weakening pourable material by means of2020
Transport module for a semiconductor fabrication device or coupling device2017
CVD reactor having a substrate holder resting on a gas cushion comprising a plur2016
Shadow mask held magnetically on a substrate support2015
Device for coating substrates disposed on a susceptor2015
Ignition coil, in particular for an internal combustion engine of a motor vehicl2013
CVD reactor having a process-chamber ceiling which can be lowered2012
CVD reactor comprising a gas inlet member2012
CVD reactor with RF-heated process chamber2011
Device for depositing in particular crystalline layers on one or more, in partic2008