Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and device for fragmenting and/or weakening pourable material by means of high-voltage discharges

Method and device for fragmenting and/or weakening pourable material by means of high-voltage discharges

US Patent 10919045 · Granted Feb 16, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and device for fragmenting and/or weakening pourable material by means of2020
Method of fragmenting and/or weakening of material by means of high voltage disc2018
CVD reactor having a substrate holder resting on a gas cushion comprising a plur2016
Device for coating substrates disposed on a susceptor2015
Ignition coil, in particular for an internal combustion engine of a motor vehicl2013
Device for the temperature control of the surface temperatures of substrates in 2012
CVD reactor having a process-chamber ceiling which can be lowered2012
CVD reactor comprising a gas inlet member2012
CVD reactor with RF-heated process chamber2011
Device for depositing in particular crystalline layers on one or more, in partic2008
Coating method2007
Device and method for the deposition of, in particular, crystalline layers on, i2006