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Method of growing nitrogenous semiconductor crystal materials |
Bernd Schottker, Michael Heuken, Holger Jurgensen, Bernd Wachtendorf |
2009-01-06 |
| 7294207 |
Gas-admission element for CVD processes, and device |
Johannes Kaeppeler, Martin Dauelsberg |
2007-11-13 |
| 7201942 |
Coating method |
Holger Jurgensen, Johannes Käppeler, Dietmar Schmitz |
2007-04-10 |
| 7056388 |
Reaction chamber with at least one HF feedthrough |
Walter Franken, Johannes Käppeler, Holger Jurgensen |
2006-06-06 |
| 6849241 |
Device and method for depositing one or more layers on a substrate |
Martin Dauelsberg, Marcus Schumacher, Holger Juergensen, Piotr Strzyzewski |
2005-02-01 |
| 6786973 |
Method for depositing in particular crystalline layers, gas-admission element and device for carrying out the method |
Markus Reinhold |
2004-09-07 |
| 6309465 |
CVD reactor |
Holger Jurgensen, Marc Deschler, Markus Schumacher, Johannes Käppeler |
2001-10-30 |