HJ

Holger Jurgensen

AI Aixtron: 20 patents #1 of 62Top 2%
Merck: 5 patents #2,116 of 9,382Top 25%
📍 Aachen, DE: #85 of 2,680 inventorsTop 4%
Overall (All Time): #165,390 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Showing 1–25 of 25 patents

Patent #TitleCo-InventorsDate
7524532 Process for depositing thin layers on a substrate in a process chamber of adjustable height Gerhard Karl Strauch 2009-04-28
7473316 Method of growing nitrogenous semiconductor crystal materials Bernd Schottker, Michael Heuken, Gerd Strauch, Bernd Wachtendorf 2009-01-06
7332038 Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates Gerhard Karl Strauch, Johannes Käppeler 2008-02-19
7201942 Coating method Johannes Käppeler, Gerd Strauch, Dietmar Schmitz 2007-04-10
7147718 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates Gerhard Karl Strauch, Johannes Käppeler 2006-12-12
7135073 Method and system for semiconductor crystal production with temperature management Michael Heuken, Gert Strauch, Harry Protzmann, Oliver Schön, Dietmar Schmitz 2006-11-14
7128786 Process for depositing III-V semiconductor layers on a non-III-V substrate Alois Krost, Armin Dadgar 2006-10-31
7078318 Method for depositing III-V semiconductor layers on a non-III-V substrate Alois Krost, Armin Dadgar 2006-07-18
7067012 CVD coating device Johannes Käppeler, Gerhard Karl Strauch 2006-06-27
7056388 Reaction chamber with at least one HF feedthrough Walter Franken, Gerd Strauch, Johannes Käppeler 2006-06-06
7033921 Method and device for depositing crystalline layers on crystalline substrates 2006-04-25
6962624 Method and device for depositing in particular organic layers using organic vapor phase deposition Gerhard Karl Strauch, Markus Schwambera 2005-11-08
6905548 Device for the deposition of crystalline layers on crystalline substrates Gerhard Karl Strauch, Johannes Käppeler 2005-06-14
6506450 Reactor for coating flat substrates and process for manufacturing such substrates Karl Heinz Bachem 2003-01-14
6309465 CVD reactor Marc Deschler, Gerd Strauch, Markus Schumacher, Johannes Käppeler 2001-10-30
6279506 Reactor for coating plane substrates and method for producing said substrates Karl Heinz Bachem 2001-08-28
5441703 Gas inlet for a plurality of reactant gases into reaction vessel 1995-08-15
5348911 Material-saving process for fabricating mixed crystals Klaus Gruter, Marc Deschler, Pieter Balk 1994-09-20
5162256 Process for producing doped semiconductor layers 1992-11-10
5149853 Organometallic compounds Dietrich Erdmann, Max E. Van Ghemen, Ludwig Pohl, Herbert Schumann, Uwe Hartmann +2 more 1992-09-22
5112432 Organometallic compounds Dietrich Erdmann, Max E. Van Ghemen, Ludwig Pohl, Herbert Schumann, Uwe Hartmann +2 more 1992-05-12
5015747 Organometallic compounds Martin Hostalek, Ludwig Pohl, Dietrich Erdmann, Herbert Schumann, Uwe Hartmann +1 more 1991-05-14
4991540 Quartz-glass reactor for MOCVD systems Meino Heyen 1991-02-12
4903722 Extraction valve head for tanks Frank Joseph 1990-02-27
4880492 Organometallic compounds Dietrich Erdmann, Max E. Van Ghemen, Ludwig Pohl, Herbert Schumann, Uwe Hartmann +2 more 1989-11-14