Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12298660 | Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same | Hirotomo Kawahara, Daijiro AKAGI, Hiroaki IWAOKA, Michinori Suehara, Keishi TSUKIYAMA | 2025-05-13 |
| 12216398 | Reflective mask blank and reflective mask | Hiroyoshi Tanabe, Hiroshi Hanekawa | 2025-02-04 |
| 12216397 | Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof | Daijiro AKAGI, Hirotomo Kawahara, Ichiro Ishikawa, Kenichi Sasaki | 2025-02-04 |
| 12124164 | Reflective mask blank and reflective mask | Daijiro AKAGI, Takuma Kato, Keishi TSUKIYAMA, Hiroshi Hanekawa, Ryusuke OISHI +3 more | 2024-10-22 |
| 12038685 | Reflective mask blank for EUV lithography | Hirotomo Kawahara, Hiroyoshi Tanabe, Hiroshi Hanekawa, Daijiro AKAGI | 2024-07-16 |
| 11982935 | Reflective mask blank for EUV lithography | Hirotomo Kawahara, Hiroshi Hanekawa, Masafumi AKITA | 2024-05-14 |
| 11953822 | Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same | Hirotomo Kawahara, Daijiro AKAGI, Hiroaki IWAOKA, Michinori Suehara, Keishi TSUKIYAMA | 2024-04-09 |
| 11914283 | Reflective mask blank and reflective mask | Hiroyoshi Tanabe, Hiroshi Hanekawa | 2024-02-27 |
| 11822229 | Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof | Daijiro AKAGI, Hirotomo Kawahara, Ichiro Ishikawa, Kenichi Sasaki | 2023-11-21 |
| 11698580 | Reflective mask blank for EUV lithography | Hirotomo Kawahara, Hiroyoshi Tanabe, Hiroshi Hanekawa, Daijiro AKAGI | 2023-07-11 |
| 11036127 | Reflective mask blank and reflective mask | Hirotomo Kawahara, Hiroshi Hanekawa | 2021-06-15 |
| 10254640 | Reflective element for mask blank and process for producing reflective element for mask blank | — | 2019-04-09 |
| 9097976 | Reflective mask blank for EUV lithography | Kazuyuki Hayashi, Kazunobu Maeshige | 2015-08-04 |
| 9086629 | Substrate with conductive film, substrate with multilayer reflective film and reflective mask blank for EUV lithography | Kazunobu Maeshige, Kazuyuki Hayashi | 2015-07-21 |
| 8956787 | Reflective mask blank for EUV lithography and process for producing the same | Kazuyuki Hayashi | 2015-02-17 |
| 8288062 | Reflective mask blank for EUV lithography | Kazuyuki Hayashi | 2012-10-16 |
| 8168352 | Reflective mask blank for EUV lithography and mask for EUV lithography | Kazuyuki Hayashi, Ken Ebihara | 2012-05-01 |
| 8029950 | Reflective mask blank for EUV lithography | Kazuyuki Hayashi, Ken Ebihara | 2011-10-04 |
| 7960077 | Reflective-type mask blank for EUV lithography | Yoshiaki Ikuta, Ken Ebihara | 2011-06-14 |
| 7712333 | Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography | Yoshiaki Ikuta, Mika Yokoyama, Ken Ebihara | 2010-05-11 |
| 7678511 | Reflective-type mask blank for EUV lithography | Yoshiaki Ikuta, Ken Ebihara | 2010-03-16 |
| 7230695 | Defect repair device and defect repair method | Yoshiaki Ikuta | 2007-06-12 |
| 6383695 | Black matrix for liquid crystal display devices and color filter | Yasuhiko Akao | 2002-05-07 |
| 5588602 | Package changing system for supplying and discharging loaded and empty packages to and from a machine frame | Yasuhiko Kubota | 1996-12-31 |
| 4993219 | False twist processing apparatus | Yoshiyasu Maeda, Yoshikazu Tanaka | 1991-02-19 |