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Reflective mask blank and reflective mask |
Hiroshi Hanekawa, Toshiyuki Uno |
2025-02-04 |
| 12038685 |
Reflective mask blank for EUV lithography |
Hirotomo Kawahara, Toshiyuki Uno, Hiroshi Hanekawa, Daijiro AKAGI |
2024-07-16 |
| 11914283 |
Reflective mask blank and reflective mask |
Hiroshi Hanekawa, Toshiyuki Uno |
2024-02-27 |
| 11835852 |
Reflective mask blank for EUV exposure, and reflective mask |
— |
2023-12-05 |
| 11698580 |
Reflective mask blank for EUV lithography |
Hirotomo Kawahara, Toshiyuki Uno, Hiroshi Hanekawa, Daijiro AKAGI |
2023-07-11 |
| 11281088 |
Reflective mask blank for EUV exposure, and reflective mask |
— |
2022-03-22 |
| 10890842 |
Reflective mask blank, reflective mask, and process for producing reflective mask blank |
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2021-01-12 |
| 6150059 |
Photomask and method of exposure using same |
Shinji Ishida, Tadao Yasuzato |
2000-11-21 |
| 5945237 |
Halftone phase-shift mask and halftone phase-shift mask defect correction method |
— |
1999-08-31 |
| 5631110 |
Process of fabricating photo-mask used for modified illumination, projection aligner using the photo-mask and method of transferring pattern image from the photo-mask to photo-sensitive layer |
Satomi Shioiri |
1997-05-20 |
| 5559583 |
Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer |
— |
1996-09-24 |
| 5476736 |
Projection exposure method and system used therefor |
— |
1995-12-19 |
| 5434647 |
Projector for exposing photosensitive substrate |
— |
1995-07-18 |
| 5275894 |
Phase shifting mask |
— |
1994-01-04 |
| 5002647 |
Process for preparation of thick films by electrophoresis |
Seitaro Fukushima, Etsuji Kimura |
1991-03-26 |