Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12265202 | Far-infrared ray transmission member and method for manufacturing far-infrared ray transmission member | Yoji YASUI, Takahiro Mashimo, Takuji Oyama, Nobutaka Aomine, Manaya Kubono | 2025-04-01 |
| 11286201 | Cover glass and glass laminate | Nobutaka Aomine, Hiroyuki Okawa, Kiyoshi Tamai, Hitoshi Onoda, Makoto Sano +1 more | 2022-03-29 |
| 10677963 | Curved substrate with film, method for producing the same, and image display device | Azusa Takai, Yusuke Kobayashi, Takaaki Murakami | 2020-06-09 |
| 10501369 | Translucent substrate, organic LED element and method of manufacturing translucent substrate | Takahiro Mashimo, Naoto KIHARA, Teruo Fujiwara, Masahiro Kishi, Nobuhiro Nakamura +1 more | 2019-12-10 |
| 10239783 | Method of producing glass substrate and glass substrate | Hiroshi Hanekawa, Nobutaka Aomine, Yuki Aoshima, Hirotomo Kawahara | 2019-03-26 |
| 10204767 | Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source | Hirotomo Kawahara, Nobutaka Aomine, Yuki Aoshima, Hiroshi Hanekawa | 2019-02-12 |
| 9988303 | Coating film-equipped glass substrate, and method for producing coating film-equipped glass substrate | Hiroshi Hanekawa, Nobutaka Aomine, Hirotomo Kawahara, Yuki Aoshima | 2018-06-05 |
| 9922805 | Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source | Hirotomo Kawahara, Nobutaka Aomine, Yuki Aoshima, Hiroshi Hanekawa | 2018-03-20 |
| 9423684 | Reflective mask blank for EUV lithography and process for its production | Masaki Mikami | 2016-08-23 |
| 9097976 | Reflective mask blank for EUV lithography | Kazuyuki Hayashi, Toshiyuki Uno | 2015-08-04 |
| 9086629 | Substrate with conductive film, substrate with multilayer reflective film and reflective mask blank for EUV lithography | Kazuyuki Hayashi, Toshiyuki Uno | 2015-07-21 |