MM

Masaki Mikami

AC Asahi Glass Co.: 14 patents #108 of 2,251Top 5%
AG Agc: 1 patents #509 of 954Top 55%
📍 Chiyoda, JP: #243 of 1,712 inventorsTop 15%
Overall (All Time): #295,507 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
10775692 Method for manufacturing multilayer film-deposited substrate and multilayer film-deposited substrate Yunosuke Ishikawa, Makoto Kurumisawa 2020-09-15
9720316 Reflective mask blank for EUV lithography and process for its production, as well as substrate with reflective layer for such mask blank and process for its production 2017-08-01
9448469 Reflective mask blank for EUV lithography, or reflective layer-coated substrate for EUV lithography, and process for its production 2016-09-20
9423684 Reflective mask blank for EUV lithography and process for its production Kazunobu Maeshige 2016-08-23
9207529 Reflective mask blank for EUV lithography, and process for its production Takeru Kinoshita, Kazuyuki Hayashi 2015-12-08
9052601 Reflective mask blank for EUV lithography and process for its production, as well as substrate with reflective layer for such mask blank and process for its production 2015-06-09
8993201 Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate Mitsuhiko Komakine, Yoshiaki Ikuta 2015-03-31
8986910 Optical member for EUV lithography 2015-03-24
8927179 Optical member for EUV lithography, and process for production of reflective layer-equipped substrate 2015-01-06
8828626 Substrate with reflective layer for EUV lithography and reflective mask blank for EUV lithography Takeru Kinoshita 2014-09-09
8580465 Multilayer mirror for EUV lithography and process for its production Mitsuhiko Komakine, Yoshiaki Ikuta 2013-11-12
8088538 Reflective mask blank for EUV lithography Kazyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama 2012-01-03
7906259 Reflective mask blank for EUV lithography Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama 2011-03-15
7833682 Reflective mask blank for EUV lithography and substrate with functional film for the same Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama 2010-11-16
7736821 Reflective mask blank for EUV lithography and substrate with a conductive film for the mask blank Kazuyuki Hayashi, Takashi Sugiyama 2010-06-15
6678866 Notification information display apparatus notification information display system and recording medium Hideo Sugimoto, Yukio Ishikawa, Toshiya Fukuda, Tetsuya Uchida, Tomoko Koda +8 more 2004-01-13